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Crolles2 adopts KLA-Tencor DUV brightfield system

Posted: 15 Jun 2006 ?? ?Print Version ?Bookmark and Share

Keywords:manufacturing? 2800? broadband DUV brightfield? inspection? Crolles2 Alliance?

KLA-Tencor announced that the Crolles2 Alliancea 300mm manufacturing and R&D collaboration between Freescale Semiconductor, STMicroelectronics and Philips Semiconductorshas adopted the 2800 broadband DUV brightfield system. KLA-Tencor said Crolles2 has been able to identify yield-impacting defects that it was unable to detect using previous-generation inspection tools.

"We are very pleased with the success of this collaboration between the Crolles2 Alliance and KLA-Tencor. By engaging early in the development of this tool we have accelerated our defect learning by almost six months and continue to uncover unique use cases each month on both our 90nm and 65nm technologies," said Joel Hartmann, fab director at the Crolles2 Alliance. "As a result of this partnership with KLA-Tencor, and to meet our factory ramp, we decided to install additional 2800 inspection capacity."

The 2800 is said to enable a very wide capture of all defect types on all layers, and has been integrated into both pilot lines and production fabs. KLA-Tencor revealed that the 2800 has been installed in logic, memory and foundry fabs worldwide, including multiple installations in several fabs.

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