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NanoInk, SIINT to provide nanoscale repair solutions

Posted: 27 Jun 2006 ?? ?Print Version ?Bookmark and Share

Keywords:licensing agreement? nanoscale repair? photomask? Dip Pen Nanolithography? DPN?

NanoInk Inc. and SII NanoTechnology Inc. (SIINT), a subsidiary of Seiko Instruments Inc., announced that they have signed an exclusive licensing agreement to provide nanoscale repair solutions to the photomask industry. The two companies will collaborate on projects that will involve modification of NanoInk's proprietary Dip Pen nanolithography (DPN) technology to be integrated with SIINT's photomask repair instruments and nanomachining platforms. Financial terms of the agreement were not disclosed.

The companies commented in a press statement that photomask repair industry challenges are tied to smaller defects that cannot be addressed with current options. Both companies anticipate that with computer chip nodes going down in size to 65nm and 45nm, the photomask repair industry requires capabilities that are available only with new technology provided by NanoInk's DPN. The development work will be performed both in the United States and Japan.

"This agreement offers SIINT the opportunity to work closely with a U.S.-based nanotechnology company that has a solid global intellectual property portfolio," said Hiroyuki Funamoto, president and CEO of SIINT. "With this co-development partnership, SIINT will bring nanoscale repair solutions to the marketplace in the near future."




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