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Toppan Photomasks to expand Shanghai facility

Posted: 12 Jul 2006 ?? ?Print Version ?Bookmark and Share

Keywords:Toppan Photomasks? photomask? 180nm? lithography? Dylan McGrath?

Toppan Photomasks Inc. plans to expand its photomask production plant in Shanghai, China, adding capacity to produce photomasks for 180nm ICs and additional lithography and inspection capacity for products 250nm and above, the company disclosed early this week.

According to Toppan Photomasks, the expansion will add an unspecified amount of clean room space and enhanced process, inspection and repair capabilities to supply photomasks to China's growing electronics market. The project is expected to make the expanded clean room available in the third quarter of 2006, and to ramp additional capacity and capabilities in Q4, according to Toppan Photomasks, a subsidiary of Japan's Toppan Printing Co. Ltd.

Dave Murray, Toppan Photomasks' president and CEO, said through a statement that the expansion is being prompted by the company's continued growth in China.

According to Toppan Photomasks, the expansion is the fourth since the company, formerly DuPont Photomasks Inc., opened the facility in 1996.

- Dylan McGrath
EE Times

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