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TSMC adds support for Blaze DFM optimization software

Posted: 26 Jul 2006 ?? ?Print Version ?Bookmark and Share

Keywords:Taiwan Semiconductor? TSMC? Blaze MO? Blaze DFM? XX?

Foundry chip maker Taiwan Semiconductor Manufacturing Co. Ltd (TSMC) is adding support for Blaze MO optimization software from Blaze DFM Inc. with both companies supplying evaluation kits.

TSMC has developed 90nm and 65nm design kits for Blaze. These design kits include pre-qualified critical dimension bias ranges, optical proximity correction directives and GDSII layer specifications for the TSMC-supported method of GDSII annotation. The TSMC Blaze enablement project also included the incorporation of Blaze MO annotations into the TSMC resolution enhancement techniques and mask data preparation flow.

Blaze MO uses information about design intent, such as timing constraints, to drive a manufacturing-aware optimization of integrated circuit designs for reduced leakage power and variability. The two companies have agreed to work together to enable and evaluate Blaze MO usage by TSMC customers.

"With Blaze MO, we see a good potential to reduce leakage and manufacturing variability," said Ed Wan, TSMC senior director of Design Service Marketing, in a statement issued by Blaze DFM.

"We worked diligently with TSMC to qualify the electrical and lithography impact of Blaze CD biasing decisions on the TSMC process," said Andrew Kahng, co-founder, CTO and chairman of Blaze DFM.

- Peter Clarke
EE Times

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