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SDK steps up high-purity chlorine production

Posted: 25 Oct 2006 ?? ?Print Version ?Bookmark and Share

Keywords:Showa Denko K.K.? high-purity chlorine? LCD? etching gas?

Showa Denko K.K. (SDK) is expanding its production capacity of high-purity chlorine at its Kawasaki Plant to meet the growing demand for high-purity chlorine in the manufacture of semiconductors and LCDs. Market growth for high-purity chlorine is forecasted to grow three times from its 2005 level by 2010.

The purification capacity will increase from 300 to 1,000 tons per year, and the filling capacity from 300 to 600 tons a year, both by the end of 1H 2007. Depending on the demand growth, the filling capacity will be further increased to 1,000 tons a year by the end of 2008.

High-purity chlorine has been used mainly as an etching gas in the manufacture of semiconductors. Today, demand for it is growing as an etching gas in LCD production for the process of providing arrays of thin-film transistors on the glass substrate.

In manufacturing semiconductors, several gases are used to cope with the progress of miniaturization of electronic devices. Although there has been a partial change in the types of gases used, demand for high-purity chlorine is expected to remain stable.

Under its ongoing three-year consolidated business plan, named "Passion Project," SDK classifies its business in semiconductor-processing materials, with specialty gases, as one of the growth drivers. Currently, SDK is providing 18 different types of specialty gases for etching, chamber cleaning and film-forming.

Moreover, SDK is planning to increase its annual sales of semiconductor-processing materials to about $253 million by 2008.

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