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Litho tool imprints 30 wafers per hour

Posted: 08 Feb 2007 ?? ?Print Version ?Bookmark and Share

Keywords:nano-imprint lithography? litho? Obducat? Sindre? lithography?

Obducat AB has introduced Sindre, a nano-imprint lithography system for high-volume manufacturing.

The Sindre system, named after a legendary blacksmith dwarf of Nordic mythology, is able to imprint 30 200mm wafers per hour. A subsequent model will be capable of up to 90 wafers per hour, according to Obducat.

The company, which claims to have a 40 percent market share in nano-imprint lithography, said the Sindre system offers a manufacturing-level solution for devices in cameras, mobile phones, flat screens and next-generation HDDs.

Products within the optoelectronics sector already benefit from Obducat's production technology, said Patrik Lundstrom, CEO of the company.

Obducat's solution is based on two key technologies: the intermediate polymer stamp (IPS) and simultaneously combined UV and thermal (STU). No other details were given.

- Mark LaPedus
EE Times

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