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Calibrator boosts wafer-level RF measurement

Posted: 12 Feb 2007 ?? ?Print Version ?Bookmark and Share

Keywords:calibration? RF measurement? WinCal? Cascade? calibrator?

The proliferation of wireless CE devices with complex, multiport RF architecture has pushed engineers to perform much more difficult and complex RF measurements on their wafer-level RF devices. To ease the process, Cascade Microtech has expanded the capability of its popular WinCal calibration software to include key features that will provide faster and more accurate wafer-level RF measurement.

Unique in the wafer test market, only WinCal XE combines advanced calibration with RF accuracy enhancement features. Through powerful new measurement support tools and guidance systems that minimize operator mistakes, WinCal XE enables accurate and reliable RF measurements, a real problem with complex semiconductor designs.

An increasingly common RF measurement challenge is the characterization of differential architectures requiring four measurement ports. Advanced two-port calibration methods, which are highly tolerant of probe placement uncertainty often experienced in wafer probing, are available today, but to date an advanced calibration method for four-port measurements has not been available. A further complication is that four-port system setup and calibration require many more steps than two-port system calibration and thus has greater opportunity for error.

WinCal XE provides new advanced hybrid calibration algorithms not available elsewhere, the company said. The hybrid calibration assures a precision "probing tolerant" calibration for four-port differential measurements. WinCal XE also simplifies four-port measurements by offering straightforward multiport setup guides, management of multiport calibration standards and vector network analyser ports, automatic calibration and validation of up to four ports.

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