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Nikon to ship EUV tools to Intel, Selete

Posted: 28 Feb 2007 ?? ?Print Version ?Bookmark and Share

Keywords:Nikon? extreme ultraviolet lithography? EUV? Intel? Selete?

Nikon Corp. here outlined its roadmap in the extreme ultraviolet (EUV) lithography arena and disclosed plans to ship two prototype tools by year's end. The first two tools are reportedly heading to Intel Corp. and Selete, sources said.

The company will take a two-step approach to EUV. Nikon will develop and ship a prototype tool in 2007, followed by a production machine that is due out in the 2009 time frame.

For some time, Nikon has been developing an EUV tool for R&D. That tool, now dubbed the EUV1, is a 13.5nm wavelength machine, which has a projection lens equipped to support a numerical aperture (NA) of 0.25. The machine has an overall resolution of 45nm (half-pitch) and the ability to pattern 25nm lines and spaces. It has a field size of 25-by-33mm?, an overlay of 10nm, a 10 percent flare specification, and an overall throughput of 5 to 10 wafers per hour.

On the other hand, the production tool, dubbed the EUV2, is also a 13.5nm machine with an NA of 0.25. It will have an overall resolution of 32nm (half-pitch) and the ability to pattern 21nm lines and spaces. It has a field size of 25-by-33mm?, an overlay of 1nm, a 7 percent flare specification, and an overall throughput of 50 to 100 wafers per hour.

- K.C. Krishnadas
EE Times




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