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DNP, Takumi partner on photomask inspection

Posted: 28 Feb 2007 ?? ?Print Version ?Bookmark and Share

Keywords:Takumi Technology? Dai Nippon Printing? DNP? Takumi? photomask inspection system?

Dai Nippon Printing Co. Ltd (DNP) teams up with Takumi Technology Corp. for the development of an automated, criticality-aware photomask inspection system aimed to reduce the manufacturing cost and turn-around-time (TAT) of advanced photomasks. Joining this partnership is a major semiconductor manufacturer, still unnamed as of press time.

According to Naoya Hayashi, general manager of DNP Electronic Device Laboratory, the system will allow engineering teams to rank each region in the photomask using criticality awareness to determine if the area has critical defects, non-critical defects, no defects, or regions with small impact or no impact on semiconductor performance. The system will also allow semiconductor makers to minimize the effects of mask overkill and produce better mask yields, while reducing inspection costs.

Hayashi added, "We have investigated various approaches to deploy criticality-aware mask inspection and concluded that Takumi's design driven defect analyzer software is the most advanced off-the-shelf technology available today. It is a very flexible platform that can be extended to include DNP's unique requirements in managing exploding data file sizes, seamless data transfer between customers and DNP, and accuracy needed in translating mask image defect data to layout data format. Furthermore, Takumi's methodology enabled us to maintain our existing technical engagement model with our customer and minimize any major efforts in retooling our flow."

The system is currently in beta testing phase. DNP targets that by March 2008, the joint technology development will be completed and the system will be ready for deployment. DNP will offer the software to its customers for free and as part of their customer service.

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