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Mask metrology tool suits 45nm and beyond

Posted: 03 Apr 2007 ?? ?Print Version ?Bookmark and Share

Keywords:mask metrology system? mask metrology tool? automated mask metrology?

LMS IPRO4 mask metrology system from Vistec

Vistec Semiconductor Systems has introduced its next-generation mask metrology toolthe LMS IPRO4that's designed to support mask metrology for the 45nm technology node and beyond. This tool is a fully automated mask metrology system capable of measuring registration (overlay on reticles) and critical dimensions (CD) in transmitted and in reflected light.

"The measurement performance has been significantly enhanced," said Jochen Bender, product manager at Vistec. "The LMS IPRO4 will support the more demanding metrology needs of leading-edge semiconductor mask manufacturers and their customers."

Compared to its predecessors, LMS IPRO4 provides enhanced measurement performance with a long-term repeatability of better than 1.6nm. Contributing to the high measurement performance level are the reengineered optical path and the redesigned stage drive system, which enables higher positioning accuracy.

The design of the LMS IPRO4 combines maximum throughput with minimum programming time and operator interference. All measurement jobs can easily be prepared and learned online or offline. Another feature is the unique data evaluation software package DEVA, which remains an integral part of Vistec's LMS IPRO metrology solution. It automates the statistical analysis of the gathered data and allows the user to define data evaluation macros. Due to its networking capability, operators and engineers can remotely operate the system and evaluate the results.




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