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ST picks nano-imprint litho solution from Obducat

Posted: 04 May 2007 ?? ?Print Version ?Bookmark and Share

Keywords:nano-imprint lithography? NIL R&D system? Obducat nano-imprint litho?

STMicroelectronics has placed an order for a nano-imprint lithography (NIL) R&D system from Obducat AB to be used in a post-silicon R&D unit for development purposes. Obducat has also produced stampers that are being used in this assessment project.

Formed in 2006, the unit post-silicon technology (PST) R&D unit of STMicroelectronics, headed by Gianguido Rizzotto, has been assessing NIL technology as a potential scalable patterning method for all-organic and hybrid electronic devices with feature sizes of the order of 50nm.

"The assessment of NIL is a step forward in the development of a completely new technology platform for all-organic and hybrid electronics, that will be manufactured at ultra low-cost by means of nonphotolithographic processes," said Luigi Occhipinti, head of the all-organic electronics teams in Catania and Portici (Naples), in a statement issued by Obducat. "The achievement of device structures with nanoscale resolution via simultaneous thermal and UV-based NIL on large areas, makes the Obducat system attractive in patterning different organic materials."

- Peter Clarke
EE Times Europe




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