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Matsushita starts system LSI mass production at 45nm

Posted: 21 Jun 2007 ?? ?Print Version ?Bookmark and Share

Keywords:system LSIs? 45nm CMOS process? 45nm platform?

Matsushita Electric Industrial Co. Ltd, maker of Japanese electronics brand Panasonic, announced it has started volume production of system LSIs using its 45nm process.

The 45nm system LSIs, claimed as the world's first, were made at the chipmaker's fab in Uozu, central Japan. These devices draw on the 45nm node's higher-density circuit capabilities and offer higher speeds while reducing power consumption and streamlining chip size. This makes the new system LSIs suitable for digital CEs, which have an ever-increasing demand for power.

Matsushita said it has introduced three technologies in the 45nm node: use of an ArF immersion scanner with a numerical aperture greater than 1, use of the stress-induced mobility-enhanced transistor and design for manufacturability.

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