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Rohm and Haas spend $60M on litho equipment

Posted: 28 Jun 2007 ?? ?Print Version ?Bookmark and Share

Keywords:immersion lithography? photoresist coating? lithography equipment?

Rohm and Haas Electronic Materials will invest $60 million in lithography equipment to support R&D on advanced 193nm photoresist and anti-reflective coatings used in the manufacture of semiconductor devices.

As part of its investment, Rohm and Haas will purchase ASML's TWINSCAN XT: 1900Gi 193nm Step and Scan system. This tool, along with a new 300mm coat/develop track and defect and metrology equipment, will be installed Q1 2008.

"As a leading material supplier to the semiconductor industry, our ability to deliver advanced lithography materials is critical, especially as the industry moves down below the 45nm node," said Dominic Yang, business unit director for Rohm and Haas' Microelectronic Technologies business. "This investment will not only enable deep technical partnerships with the front runners in the memory, foundry and logic segments, but will bring to these customers high quality products manufactured and tested using the best tools in the industry."

Peter Trefonas, research and development director for Microelectronic Technologies, said the addition of an immersion tool is an important investment for Rohm and Haas. "Many of the world's leading semiconductor manufacturers?our customers?are installing advanced immersion equipment on their commercial lines. This immersion tool investment is the right step at the right time for us."

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