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Spansion starts production of NOR flash at Japan fab

Posted: 21 Sep 2007 ?? ?Print Version ?Bookmark and Share

Keywords:NOR flash fab? 300mm? manufacturing facility?

Spansion Inc. announced it has begun production of MirrorBit technology at 65- on 300mm wafers at its Spansion 1 (SP1) facility in Japan, with plans to ship to customers in high volume by the end of the year.

The SP1 wafer manufacturing site is the first factory constructed by Spansion since becoming an independent company. The company has invested a significant portion of its planned $1.2 billion to construct and equip SP1 and expects the investment to produce capacity of 15,000-20,000 300mm wafers per month. Spansion plans to produce MirrorBit Eclipse devices, with products at 45nm expected in 2008.

"We are on schedule for scaling MirrorBit technology to 45- on 300mm wafers," said Bertrand Cambou, president and CEO, Spansion. "By leveraging this next-generation facility, and the cost and technology advantages of MirrorBit technology, we can deliver on our promise to bring more value to our customers and redefine the flash memory industry."

Spansion started the 300mm development at its MirrorBit technology-dedicated R&D center in Silicon Valley, Submicron development Center (SDC). The 65nm MirrorBit technology process was developed at the SDC and has since been transferred to SP1 for production. The SDC is now currently running full flow development 300mm wafers, 45nm technology, which is targeted for transfer to SP1 in 2008.

SP1 is co-located with Spansion's other fab in Aizu, JV3, and shares some employees and facilities with JV3.

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