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TSMC taps Synopsys' design-to-mask data processing software

Posted: 27 Nov 2007 ?? ?Print Version ?Bookmark and Share

Keywords:TSMC process technologies? PCX technology Synopsys? design to mask software?

Taiwan Semiconductor Manufacturing Co Ltd. has successfully implemented Synopsys Inc.'s new PCX technology to reduce design-to-mask cycle-time for its advanced process technologies. Proteus-CATS data eXchange (PCX) technology is a highly scalable parallel interface technology designed to reduce data communication overhead and turnaround time between Synopsys' Proteus optical proximity correction (OPC) and CATS mask data preparation (MDP) software.

Developed for both the GDS and OASIS library data formats, PCX technology is capable of processing hundreds of gigabytes of post-OPC data with almost zero MDP input overhead, says Synopsys. PCX technology includes user-defined, scheduling-based, workload management options for data processing optimization. Additionally, PCX technology, claims Synopsys helps ensure that data integrity is maintained during the OPC to MDP transfer.

"Minimizing data I/O and providing an integrated OPC and mask data preparation solution plays an increasingly critical role in reducing the total cycle time for mask synthesis and mask data preparation," stated Wolfgang Fichtner, senior VP and general manager, Silicon Engineering Group, Synopsys. "Our recent implementation of PCX technology for TSMC reflects Synopsys' strong commitment to both technology and performance leadership with products that help ensure our customers' overall success."

"Synopsys PCX is the result of a technical collaboration with TSMC to provide a streamlined architecture and data transfer from OPC to MDP," said Kuo Wu, deputy director of design service marketing at TSMC.

Currently, PCX is supported on the Proteus 2006.09 and CATS 2006.09 software versions. PCX technology is compatible with the following platforms in multi-threaded and distributed processing modes: x86-64 with RHEL or SLES.

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