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TSMC, Altera, Synopsys collaborate on 45nm extraction tool

Posted: 14 Dec 2007 ?? ?Print Version ?Bookmark and Share

Keywords:45nm? extraction tool? TSMC process?

Synopsys Inc. has announced the qualification and immediate availability of the Synopsys Star-RCXT parasitic extraction solution for TSMC's 45nm process technology. This qualification is the result of collaboration between Synopsys, Altera and TSMC to develop and silicon-validate advanced modeling of key process variation effects that impact the performance of digital, analog and memory circuits. Altera is now deploying Synopsys' Star-RCXT as the preferred extraction tool for its 45nm design sign-off flow.

"We have successfully used Synopsys' Star-RCXT extraction tool on our 90nm and 65nm devices," said Eugene Chen, director of CAD Engineering at Altera Corp. "Our recent collaboration on modeling advanced 45nm process effects increases our confidence in the ability of the Star-RCXT solution to ensure the success of our next-generation devices as well. We have now standardized on the Star-RCXT solution for our 45nm design flows on the merits of its sub-femtofarad accurate process modeling, its proven track record at each successive technology node and its seamless integration with our existing Synopsys sign-off solutions."

Synopsys, Altera and TSMC worked together to develop modeling specifications for two key 45nm interconnect process effectsmicroloading and gate-to-contact coupling capacitance variation. TSMC and Altera validated that the Synopsys Star-RCXT solution provides accurate modeling of these and other 45nm process effects caused by lithography variation, chemical-mechanical polishing (CMP), width-dependent temperature variation and dielectric damage in ultralow-k process.

"TSMC and Synopsys collaborated early on to address 45nm interconnect modeling of microloading effects and gate-to-contact capacitance variation," said Kuo Wu, deputy director of design service marketing at TSMC. "The Synopsys Star-RCXT extraction tool has satisfactorily completed our qualification criteria to take full advantage of TSMC's leading 45nm process technology with a high standard of model accuracy."




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