TEL, Sharp form thin-film PV joint venture

Tokyo Electron Ltd (TEL) has entered the photovoltaic (PV) cell production business through a joint venture agreement with Sharp Corp. to commercialize plasma CVD systems for thin-film silicon PV. The JV company, christened Tokyo Electron PV Ltd, will be located in Nirasaki City, Japan.

The plasma CVD systems from this JV will be developed through TEL's experience in vacuum plasma technology for semiconductors and flat-panel display production equipment businesses, combined with the thin-film silicon PV cell production technology from Sharp.

Development of the equipment will be carried out by the JV financed by both companies. Manufacturing and sales of the equipment will be conducted solely by TEL, with the first shipments planned for 2009.

This agreement with Sharp applies only to plasma CVD systems for thin-film silicon PV cells, and is not a comprehensive alliance covering flat-panel display production equipment or other business activities.