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Dai Nippon, Brion, ST develop photomask verification for 45nm

Posted: 22 Apr 2008 ?? ?Print Version ?Bookmark and Share

Keywords:photomask verification? 45nm node? logic mask?

Brion Technologies and Japan's Dai Nippon Printing Co. Ltd (DNP) have successful demonstrated a model-based photomask verification on critical 45nm logic masks. The development work was conducted in Crolles, France, with the cooperation of STMicroelectronics.

As demands for critical dimension (CD) uniformity increase at the 45nm process node and below, model-based photomask verification allows chipmakers to more accurately understand how specific mask patterns will print on wafers by simulating and verifying the mask portion of the photolithography process prior to volume manufacturing. The resulting information can help chipmakers enhance their strategies for optical proximity correction (OPC) and other resolution enhancement (RET) technologies. The Photomask Japan paper describes how mask process signatures were simulated and the effects on CD uniformity and OPC hot spots measured.

"Model-based photomask verification is helping us to optimize our mask verification, and our RET and OPC strategies. We look forward to continuing this valuable collaboration," said Jo?l Hartmann, silicon technology development director for ST.

"This joint initiative helps us to pursue our mission of continual quality improvement and producing increasingly accurate photomasks," said Naoya Hayashi, research fellow at DNP.

"Photomasks are an integral part of the lithographic process, and we're working to incorporate mask-aware modeling into our solutions," said Jim Koonmen, general manager of Brion. "We appreciate the opportunity to pursue this important work with outstanding partners such as DNP and ST."

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