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Toppan, IBM extend photomask partnership to 22nm

Posted: 23 Jun 2008 ?? ?Print Version ?Bookmark and Share

Keywords:photomask process? 22nm node? partnership?

Toppan Printing Co. Ltd and IBM Corp. have entered a new development agreement on the last phase of 32nm and all phases of 22nm photomask process development. The joint development will take place at IBM's Burlington photomask facility in Essex Junction, VT., starting in this month.

In order to keep pace with this changing technological environment, Toppan and IBM started joint development of photomasks for 45nm semiconductors in 2005 and expanded the scope of their activities to include 32nm development in 2007.

Toppan has developed a 32nm photomask process at its facility in Asaka, Japan. Under the new agreement, Toppan will work with IBM to integrate its process into the 32nm photomask process the companies will jointly develop.

As for the 22nm semiconductor generation, the industry is considering new technologies such as EUV lithography and nanoimprint, but several technical issues remain. IBM and Toppan will embark on the development of a 22nm photomask process by ArF immersion lithography, the current mainstream technology for the manufacture of 32nm photomasks.

"This newest process development agreement with Toppan builds upon the success that our two companies have enjoyed while working together over the past several years. This newest agreement will help ensure we can continue to deliver innovative chip applications for IBM systems and our OEM semiconductor clients," said Michael Cadigan, general manager, IBM semiconductor solutions. "This collaborative effort builds upon our joint progress at 45nm and 32nm and sets us on a path to deliver the photomasks needed for next-generation chip manufacturing production."

"During the past three years of joint work, we have been nurturing a strong collaboration as well as a highly sophisticated technical development capability. We believe this joint initiative will place IBM and Toppan Printing at the forefront of advanced photomask technology development, and thus will enable us to contribute to the technological innovation in the world's semiconductor industry," said Naoki Adachi, president of Toppan.





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