Global Sources
EE Times-Asia
Stay in touch with EE Times Asia
EE Times-Asia > EDA/IP

Tools support layered modeling based on TLM-2.0

Posted: 22 Jan 2009 ?? ?Print Version ?Bookmark and Share

Keywords:design tool EDA? ESL tool design? TLM 2.0 modeling layered?

EDA vendor Mentor Graphics Corp. has announced a scalable design methodology based on transaction-level modeling (TLM) that, according to the company, allows a single model to be taken from design concept to implementation.

Mentor's Vista family of ESL design tools are structured to support an efficient "layered" modeling based on the Open SystemC Initiative's recently announced SystemC TLM Standard (TLM-2.0), the company said.

Mentor also announced an automated flow between the Catapult C synthesis tool and Vista offering a TLM wrapper generation flow, which now supports TLM-2.0 compatible models. The Catapult-Vista TLM-2.0 model generation flow bridges the gap between hardware design and system-level modeling by providing a link between the Catapult C Synthesis tool untimed ANSI C++ source and the Vista SystemC scalable design and simulation environment, according to the company.

"By providing our customers with the Vista 'single-model' Scalable Design Methodology, we hope to encourage wider industry adoption of the TLM-2.0 standard," said Simon Bloch, VP and general manager of Mentor's design and synthesis division, in a statement.

- EE Times

Article Comments - Tools support layered modeling based...
*? You can enter [0] more charecters.
*Verify code:


Visit Asia Webinars to learn about the latest in technology and get practical design tips.

Back to Top