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Litho tools propel photoresist market

Posted: 27 Apr 2009 ?? ?Print Version ?Bookmark and Share

Keywords:lithography tool? DUV litho? market photoresist?

The trend towards advanced 193nm DUV lithography tools is affecting the product mix of photoresists consumed as well as market shares of photoresist suppliers, according to the report by The Information Network.

The Global Market for Equipment and Materials for IC Manufacturing report stated that purchases of advanced 193nm optical lithography tools increased from 24 percent in 2006 to 31 percent in 2007 to 40 percent in 2008 on a unit basis as the semiconductor industry has moved toward production of devices at feature sizes 45nm and below. Suppliers of these tools, ASML, Canon and Nikon, continue to spend vast amounts of R&D to increase the performance of their products while jostling for the leadership of the lithography marketplace.

"Surprisingly, 193nm tools are cannibalizing the 248nm DUV market rather than the low-end sector," noted Robert N. Castellano, president of The Information Network. "G,I-line maintained a 37 percent share of the lithography market while 248nm tools dropped from 38 percent in 2006 to 23 percent in 2008."

The photoresist market has also been impacted. 193nm photoresist consumption on a revenue basis increased from 21 percent in 2006 to 34 percent in 2008. But shares are skewed because of the high price of 193nm resist compared to I-line resist, the latter selling for one-tenth the price of 193nm resist. On a unit basis, 193nm resist increased from just 4 percent in 2006 to 9 percent in 2008. The large installed base of I-line tools kept its share above 60 percent in 2008.

On a revenue basis, JSR led the market in 2008 with a 29 percent share, followed by TOK and Rohm and Haas (now Dow Chemical). In 2006, JSR held a 23 percent market share.

"Unit shipments of photoresist decreased between 2006 and 2008, but because of the high price of the 193nm products, revenues for the entire sector increased," added Castellano.





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