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E-beam litho tool tailored for 8nm

Posted: 29 May 2009 ?? ?Print Version ?Bookmark and Share

Keywords:lithography tool? e-beam? electron-beam device?

Vistec Lithography Inc. has launched the out its EBPG5200 electron-beam lithography tool to generate and devise structures at less than 8nm on any substrate. Applications for the tool include nanotechnology, biotechnology, integrated optics, security, semiconductor research, X-ray optics, MEMS and sensors.

The system is modular. The EBPG5200ES is the entry-level, low-cost version of the EBPG5200 series. Upgrading to the full-blown EBPG5200 can be performed at any time, depending on the user's available budget and application requirements.

Its electron-optical column supports acceleration voltages of 20-, 50- and 100kV. It claims to offer true 100kV and 1mm performance under regular electron-optical conditions.

Switching between ultra-high resolution and throughput occurs on a floating basis and is automated. No manual intervention is required, whether at the electron-optical column or in terms of program sequence.

"One example how this relates to practice is the structuring of fine gates and coarser connector pads in transistor arrays," according to the company. "By splitting the job into a coarse and fine writing strategy, throughput can be maximized. Such sub-50nm gates can be structured to run at optimum exposure current and the coarser pads exposed with a useful beam current greater than 100nA and a maximum deflection rate of 50MHz in an automatic exposure cycle."

The system includes Linux-based operational software. Users can choose the preferred data preparation scheme.

- Mark LaPedus
EE Times

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