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SEM offers high beam current, low vacuum capability

Posted: 05 Aug 2010 ?? ?Print Version ?Bookmark and Share

Keywords:scanning electron microscope? nanometer? imaging?

 Nova NanoSEM 50

FEI Co. introduces its Nova NanoSEM 50 series of ultra-high-resolution scanning electron microscopes. The SEMs provide nanometer-scale resolution and ultra-precise analysis on the widest range of samples. Initial shipments are planned for Q4 10.

George Scholes, VP and general manager, research division, FEI, noted "In one instrument, you get imaging down to the nanometer level, high beam current for fast and precise analysis, and low vacuum capability to extend the range of sample types and minimize preparation requirements."

In low vacuum, the Nova NanoSEM can examine highly insulating samples, up to nearly the same resolution that can be achieved in high vacuum, with little or no preparation, eliminating artifacts and saving time.

The Nova NanoSEM 50 Series builds on the success of previous Nova NanoSEM instruments and adds technological innovations from FEI's other industry-leading product families. It inherits its beam deceleration and low vacuum capabilities from previous-generation Nova NanoSEMs. Its integrated sample and chamber cleaning solutions, critical for low kV high-resolution imaging, and its advanced and intuitive sample navigation and user interface, debuted on the Quanta and Magellan SEMs.The universal large chamber, 16-bit scan engine and latest scanning strategies, and high-precision stage, were first deployed in the Nova and Helios NanoLab DualBeam systems.

It also introduces a new suite of detectors, retractable and in-lens, for optimized secondary electron, backscattered electron, and scanning transmission electron microscopy signal collection and filtering.

The microscope is suited for advanced material science applications. Its 110mm stage with up to 75-degree motorized tilt accepts a wide range of sample sizes and configurations, and permits electron back-scattered diffraction analysis without pre-tilted holders.

It offers a high-precision 150mm piezoelectric stage for fast, precise navigation, providing 100-percent coverage of 150mm wafers or masks, and substantial coverage of 200mm samples. Fast beam blanking, integrated 16-bit pattern generator, and a variety of beam chemistries for e-beam deposition make it ideal for prototyping and lithography applications. The instruments provide 1nm resolution at 15kV, 1.4nm at 1kV, and beam currents up to 200nA.

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