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E-beam litho system supports mask, direct-write apps

Posted: 26 Oct 2010 ?? ?Print Version ?Bookmark and Share

Keywords:electron-beam? lithography? mask writing? direct-write?

Vistec Electron Beam GmbH announces the upgrade of its electron-beam lithography system to support both mask writing and direct-write applications.

The new platform supports Vistec's variable shaped beam (VSB) e-beam as well as its \multi shaped beam (MSB) lithography system which is under development.

The e-beam is designed with a vacuum compatible air-bearing based positioning system to overcome the limitations of roller bearings for future performance requirements. This lets the company address mask writing as well as electron-beam direct write applications.

According to the company, "By applying MSB techniques, the substrate is exposed with an array of individually controlled shaped beams in parallel instead of a single shaped beam sequentially. The underlying technology continues to use the basic principle of shaped beams which significantly reduces the development risk and time."

- Mark LaPedus
EE Times

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