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Cambridge NanoTech awarded grant to develop high-speed ALD System

Posted: 01 Dec 2010 ?? ?Print Version ?Bookmark and Share

Keywords:Atomic Layer Deposition system? printed electronics supply chain?

Focused on developing electronic displays as well as flexible, printed electronics supply chain, the FlexTech Alliance has just announced that it has awarded a contract to Cambridge NanoTech to develop a high-speed Atomic Layer Deposition (ALD) system. On completion, such system shall allow the manufacture of large-area and flexible substrates for use in organic electronics, solar cells, biomedical devices, and displays.

The high-speed ALD system is planned to address the production of the high volumes needed for commercial roll-to-roll practices. ALD is a suitable coating technology since it possesses perfect, conformal, ultra-thin films which are scalable to large-area substrates. At the same time, ALD provides excellent thickness uniformity, film density, step coverage, interface quality, and low temperature processing, making ALD beneficial for both roll-to-roll flexible substrates and rigid substrates.

CEO of FlexTech Alliance, Michael Ciesinski cites, "The FlexTech Alliance supports the mission to help build a commercially viable industry around flexible and printed electronics." He adds, "The high-speed ALD system that Cambridge NanoTech will develop with this award stands to play a key role in commercializing the flexible electronics market."

To help accelerate the ALD process, the engineering team at Cambridge NanoTech focuses on cycle time reduction by means of a unique high speed precursor delivery and extraction mechanism. The beta system would be installed at the Flexible Display Center at Arizona State University in 2012. Additionally, Cambridge NanoTech is also developing film processes which are applicable to electronics and display manufacturers.





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