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RTL-to-GDSII reference flow launched

Posted: 20 Jan 2011 ?? ?Print Version ?Bookmark and Share

Keywords:reference flow? RTL to GDSII? low power process technology?

Magma Design Automation announced the availability of a hierarchical RTL-to-GDSII reference flow for the Common Platform alliance's 32/28nm low-power process technology. This reference flow leverages the Talus\ IC implementation system's unique power optimization and management capabilities, the latest ARM Artisan 32/28nm LP process libraries and the Common Platform alliance's advanced 32/28nm process technology to enable designers to reduce power, turnaround time and cost per die.

The hierarchical reference design was implemented using Magma's Talus RTL-to-GDSII flow and the latest ARM Artisan 32/28nm LP libraries optimized for the Common Platform 32/28LP process libraries; standard cells, memory compilers and GPIOs. This successful design implementation demonstrates that the flow provides key low-power design capabilities, including an automated multiple voltage-domain design methodology, validates tool and library interoperability and facilitates rapid user adoption through the inclusion of a sample design which can be accessed from Magma or the Common Platform alliance.

"The RTL-to-GDSII reference flow, combining Magma's software and the Common Platform alliance's 32/28nm process technology, will enable our foundry customers to enjoy the benefits of power, performance and time to market for their advanced ICs," said K.M. Choi, VP of the Infrastructure Design Center, System LSI, Samsung Electronics, on behalf of the Common Platform alliance.

"A large percentage of leading semiconductor companies are already using Talus for 32/28-nm designs, and the list is growing," said Premal Buch, general manager of Magma's Design Implementation Business Unit. "By working with the Common Platform alliance to develop this flow and reference design we reinforce our commitment to providing proven, effective 32/28nm design solutions."

The Magma Reference Flow for Common Platform alliance 32/28nm Low-Power Process is available upon request from Samsung Electronics, GLOBALFOUNDRIES and Magma.

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