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Plasma ALD enables high impact technologies

Posted: 27 Jun 2011 ?? ?Print Version ?Bookmark and Share

Keywords:atomic layer deposition? microelectronics?

Cambridge NanoTech has launched its 40th Fiji Plasma Atomic Layer Deposition (ALD) system. The company first introduced its Fiji system in 2009, delivering flexibility and eas of experimental use. The system's process versatility, functionality, and compact footprint has made it a sought after Plasma ALD tool for researchers and technologists looking to produce ultra-thin coatings that are highly precise, digitally controlled, pin-hole free, and perfectly dense.

ALD is used to enable high impact technologies, such as microelectronics, lighting and display, and energy storage.

As an ALD supplier to academic and industrial institutions worldwide, Cambridge NanoTech continually seeks ways to advance ALD research and industrialization. Cambridge NanoTech has gained experience in the plasma ALD realm by conducting internal research and solving customers' research challenges. The company's scientists have developed plasma ALD processes for a variety of oxides, nitrides, and metals, including titanium nitride, platinum, and other materials. The resulting plasma recipes allow for low resistivity of titanium nitride, and lower temperatures for depositing platinum.

Cambridge NanoTech has created a collaborative research environment, enabling customers to have access to this wealth of experience and advice from the company's scientific team. Whether a customer is looking to develop a new ALD process, overcome a research obstacle, or commercialise discoveries in the lab, Cambridge NanoTech scientists are on hand to guide them.

"For research being conducted at the Universit catholique de Louvain (UCL), we were looking for high-k conformal thin films deposited at room temperature. Cambridge NanoTech has come to us with a complete solution, integrating many features in a state-of-art tool allowing us a broad range of material selection," said Laurent Francis, PhD., Microsystems Chair, UCL. "As we were not acquainted with ALD technology, Cambridge NanoTech offered excellent support with both the ALD technique and the Fiji F200 tool that we installed at UCL. The on-site installation of the equipment was performed adeptly by Cambridge NanoTech's technical team. For an academic institution such as ours, Cambridge NanoTech provided us with a solution suited to a broad range of research purposes. The competence of Cambridge NanoTech in ALD systems is undoubtedly a great asset."

"The Fiji ALD system combines ease of use with a set of functionality that allows researchers to deposit materials under varying conditions, including high and low temperatures," said Jill S. Becker, PhD., President and Founder, Cambridge NanoTech. "Our customers also appreciate the system's add-on features, such as the Wafer Plus module for larger samples, the Cluster module for automation integration, and the High Temperature module for processing samples up to 800C."

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