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Imec rolls 14nm process development kit

Posted: 08 Mar 2012 ?? ?Print Version ?Bookmark and Share

Keywords:14nm? process development kit? EUV lithography?

Imec has released what it boasts is the industry's first process development kit (PDK) to roll new technologies at the 14nm node. The early-version PDK is seen to address introduction of technologies that include FinFET and EUV lithography. Users of the PDK can expect to receive incremental updates from Imec.

The PDK could set the road for the use of FinFETs, which have a larger drive per unit footprint and higher performance at low supply voltages compared to the traditional planar technologies. Evolutions of this PDK will also gradually introduce the use of high-mobility channel materials. The PDK includes elements of both immersion- and EUV lithography, opening the way for a gradual transition from 193nm immersion to EUV lithography.

300mm directed self-assembly process
Imec has recently developed what it touts as the world's first 300mm fab-compatible directed self-assembly (DSA) process line. DSA is an alternative patterning technology that enables frequency multiplication through the use of block copolymer. It can also be used to repair defects and repair uniformity in the original print. This repair feature is especially useful in combination with EUV lithography.

This first 14nm PDK contains all elements for design assessment of the 14nm node through device compact models, parasitic extraction, design rules, parameterized cells (pcells) and basic logic cells, stated Imec. Starting from the PDK, Imec and its partners are now designing a first test chip, planned for release by 2H12. It will allow testing the device-, interconnect-, process- and litho assumptions, as well as performance and power of circuits implemented at the tight area budgets of the 14nm node.

The 14nm PDK was developed in the frame of Imec's INSITE program, and together with all the partners involved in this collaborative affiliation program. Through the INSITE program, research institute offers its partners a very early insight in technologies. This way, companies can anticipate upcoming developments and start designing the more advanced systems and applications today, and get them on the market faster.

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