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Nikon, IME to open lithography R&D lab in Singapore

Posted: 21 Dec 2012 ?? ?Print Version ?Bookmark and Share

Keywords:ArF immersion lithography? R&D? non-volatile memory?

Nikon Corporation announced that it has partnered with the A*STAR Institute of Microelectronics (IME) to set up a joint R&D laboratory that will focus on advancing lithography technology used in semiconductor chip manufacturing.

Nikon will tap IME's process technology and talent pool to develop multiple patterning and direct self- assembly techniques to drive the extension of ArF deep ultraviolet dry and immersion lithography down to geometry of 20nm and beyond, targeting advanced applications including logic, high density memory, embedded non-volatile memory, high-speed electronics and nanophotonics, and nano-electromechanical systems.

According to Nikon, the collaboration is a strategic addition to new capabilities in Singapore and will enable the company to get early insights into its next-generation systems and shorten time-to-market. It will also enable Nikon to learn how to push ArF immersion lithography further for several device nodes.

IME Executive Director Dim-Lee Kwong described the partnership as "a significant milestone for advanced semiconductor R&D in Singapore."

Separately, IME recently launched its 2.5D through-silicon-interposer (TSI) multi-project wafer service. According to the organisation, the service is aimed at providing a cost-effective platform for R&D prototyping and proof-of-concept in 2.5D TSI technology. (See A*STAR offers 2.5D TSI MPW service.)





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