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Temperature sensing sol'n geared for LED MOCVD

Posted: 28 Dec 2012 ?? ?Print Version ?Bookmark and Share

Keywords:LED? MOCVD? temperature measurement instrumentation?

LumaSense Technologies Inc. has released what it declares as the newest generation of non-contact temperature measurement instrumentation for Metal Organic Chemical Vapor Deposition (MOCVD) processes in the LED industry. The UV 400 and UVR 400 are geared to help manufacturers using MOCVD improve efficiency and reduce waste in their LED manufacturing process, stated the company.

Using a centre wavelength in the UV spectrum (400nm) these pyrometers make it possible to measure real wafer surface temperature, while traditional pyrometers are only able to measure the susceptor/pocket temperature under the wafer. This allows the most accurate and repeatable control of the wafer temperature which e.g. in LED production is critical to the final product wavelength and manufacturing yields.

The wide temperature range of 650C to 1300C allows for measurement of various applications such as GaN buffer layer growth or multiple quantum well growth. The fast response time of up to 8ms allows the measurement of fast processes. True photon-counting instrumentation guarantees the best achievable signal to noise ratio and stability.

In addition to the UV 400 pyrometer, the UVR 400 features a 635nm laser reflectometer, which enables the real-time measurement of the thickness and growth rate of the GaN layer during epitaxy growth.

The UV 400 and UVR 400 can also be combined with the well-proven PhotriX pyrometer with concentric lightpipe from LumaSense to additionally control the reactor temperature. Either the UV 400 and UVR 400 alone, or in combination with the PhotriX pyrometer, provide the best possible measuring data and process control solution, as well as the best product quality and improved yield.





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