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Molecular Imprints comes first in 450mm race

Posted: 22 Jan 2013 ?? ?Print Version ?Bookmark and Share

Keywords:Nano-imprint technology? Imprio 450? 450mm wafers? fab tool? single-step process?

Molecular Imprints Inc. (MII), a lithography firm specialising on advanced Nano-imprint technology, recently announced that one of its machines is being used by an unnamed semiconductor company to support the development of chip production on 450mm diameter wafers. MII has claimed that the availability of the machine would shorten the IC industry's transition to 450mm wafers by at least two years.

The firm said its Imprio 450 machine was accepted by the unnamed semiconductor company at the end of 2012. The company added that the unit is being used as part of a multi-year wafer services development contract.

Last week, at the Industry Strategy Symposium organised by fab tool vendor trade group SEMI, Robert Bruck, a corporate vice president at Intel Corp., showed one of the first fully-patterned 450-mm diameter wafers.

The J-FIL imprint lithography technology has demonstrated 24nm patterning with line edge roughness of less than 2nm to 3 sigma and critical dimension uniformity to 1.2nm 3 sigma. It offers the prospect of 10nm patterning with single-step process.

"In an era where multi-year and multi-billion dollar optical lithography development programmes are becoming the norm we were able to design, build and deliver an advanced nano-imprint platform in just one year from receiving the customer's purchase order," said Mark Melliar-Smith, CEO of Molecular Imprints, in a statement.

He added that the capabilities of the Imprio 450 were well aligned to the needs of semiconductor memory manufacturing but that the company is also making progress towards placing J-FIL technology into high volume production of advanced CMOS devices.

- Peter Clarke
??EE Times

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