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MII rolls out first of three advanced imprint modules

Posted: 24 Apr 2013 ?? ?Print Version ?Bookmark and Share

Keywords:Molecular Imprints? imprint modules? sub-20nm? Jet? Flash?

Molecular Imprints Inc. (MII) has recently shipped the first of three advanced imprint modules scheduled for this quarter. The modules will be integrated into MII's equipment partner's stepper systems. The devices include the company's latest Jet and Flash imprint lithography (J-FIL) technology which will deliver the performance required for high volume manufacturing of advanced semiconductor memory devices at sub-20nm dimensions.

MII's CEO Mark Melliar Smith stated that their latest imprint modules shipments incorporate enhanced magnification control and exposure technology along with better onboard resist filtration, real time precision machine controls, and an upgraded resist jetting system which significantly improve defectivity, throughput, overlay accuracy and overall cost of ownership. He added that all the improvements were achieved while still delivering a lower cost system platform and smaller footprint.

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