Mentor Graphics, Globalfoundries team up for 20nm kits

Mentor Graphics recently announced its collaboration with Globalfoundries to deliver 20nm design kits for the Olympus-SoC netlist-to-GDS platform. The Olympus-SoC place and route system provides a comprehensive netlist-to-GDS flow including support for new DRC, double patterning, and DFM rules for GLOBALFOUNDRIES 20nm technology.

"Double patterning and timing closure at advanced nodes require a comprehensive suite of design tools and methodologies," said Andy Brotman, vice president of design infrastructure at GLOBALFOUNDRIES. "Mentor solutions, including Olympus-SoC, help ensure that designs using our 20nm technologies perform and yield well by efficiently utilising our DRC+ technology to achieve rapid manufacturing closure and avoid lengthy delays in the design cycle."

The Olympus-SoC router has its own native colouring engine along with verification and conflict resolution engines that detect and automatically fix double patterning violations. Expanded features include DP-aware pattern matching, colouring-aware pin access, pre-colouring of critical nets, and DP-aware placement. The Calibre InRoute product allows Olympus-SoC customers to natively invoke Calibre signoff engines during design for efficient and faster manufacturing closure.