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TSMC certifies Synopsis' design solution for 16nm FinFETs

Posted: 10 Sep 2013 ?? ?Print Version ?Bookmark and Share

Keywords:TSMC? Synopsys? FinFET? DRM? iPDK?

Synopsys recently announced TSMC's certification of Synopsys' Laker custom design solution for the TSMC 16nm FinFET process Design Rule Manual (DRM) V0.5 as well as the availability of a 16nm interoperable process design kit (iPDK) from TSMC.

"Synopsys is TSMC's long-term Open Innovation Platform partner," said Suk Lee, TSMC's senior director for Design Infrastructure Marketing Division. "The certification of Synopsys' Laker custom design solution demonstrates our collaboration to serve mutual customers' adoption of 16-nm FinFET technology."

With its robust support for the iPDK standard, Synopsys' Laker custom design solution provides users with access to a wide range of TSMC process technologies, from 180nm to 16nm. Along with support for the TSMC 16nm V0.5 iPDK, the Laker tool has been enhanced to enable full use of FinFET technology.

"Synopsys has been working closely with TSMC to prepare for the 16nm generation of design technology," said Bijan Kiani, Synopsys' vice president of product marketing. "With early SPICE model development, close collaboration with the Synopsys IP team and now with the enablement of the Laker custom design solution, we are well prepared to support TSMC's 16nm technology and customers."

Laker enhancements for 16nm layout include an extensive set of new features for FinFET devices, including fin grid pattern snapping, fin display and interactive FinFET rule checking. Laker's built-in double-pattern checking has been enhanced to support pre-colouring and colour density checking. Laker support for MEOL layers includes contactless connectivity, unidirectional layer rules and enhancements to support 16nm guard rings. Laker has also been enhanced to support continuous diffusion (CNOD) and poly over diffusion edge (PODE) abutment rules used in the TSMC 16nm V0.5 iPDK.





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