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EVG unveils full-field UV nanoimprint lithography system

Posted: 05 Dec 2013 ?? ?Print Version ?Bookmark and Share

Keywords:EV Group? nanoimprint lithography? UV? UV-NIL?

EV Group (EVG) has announced the EVG 720 automated UV nanoimprint lithography (UV-NIL) system. According to the firm, the system offers full-field imprint lithography with an integrated soft stamp/template fabrication capability, and enables throughputs of more than 60 wafers per hour with the lowest cost of ownership (CoO).

Capable of printing nanostructures as small as 40nm in diameter over a large area in volume production, the EVG720 system is geared for use in manufacturing optics, photonics, LEDs, microfluidics and other bioMEMS devices, as well as advanced data storage devices. The EVG720 UV-NIL system uses a next-generation UV-NIL process designed specifically to address the needs of high-volume manufacturing (HVM). It provides an unmatched combination of high throughput, ease of use and high resolution—enabling volume manufacturing of nanoscale structures at the lowest CoO. EVG's UV-NIL solutions, including the EVG720 system, are designed to work with a variety of resist materials. This open materials platform approach provides customers with a high degree of flexibility and process customization, noted EVG.


In addition, the system has an integrated stamp replication capability, which minimizes tool footprint and avoids increased capital equipment costs associated with stand-alone replication systems. EVG's soft working stamps have optimized releasing properties that extend the life of the stamp and enable ideal imprint results on both flat and rough substrates. Traditional stamps wear down quickly or require additional surface treatment after each imprint and result in increased defectivity on the substrate that leads to yield loss, as well as increased costs from continuous replacement.

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