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Squeezing in Moore: Steppers for 10nm, EUV for 7nm

Posted: 17 Sep 2014 ?? ?Print Version ?Bookmark and Share

Keywords:EUV? lithography? 10nm? 7nm?

"Masks are at much lower volumes than wafers, so mask makers are vulnerable to appetite changes in the industry, and they are more conservative, hence showing our progress to mask folks is important to encourage [their EUV] development."

EUV still faces several challenges, the biggest of which is the need for a reliable, higher-power light source to drive throughput to a target of at least 1,000 wafers a day. Van den Brink says ASML currently has an EUV system running in its lab with a 77W light source.

By the end of the year, the company expects to have an 80W light source working, twice as powerful as the 40W source its customers are using today. The 80W light source will be a key component to a 3350B system it will supply to key customers next year.


ASML is on target to deliver an 80W EUV system in 2015.

The 3350B will ultimately hit 1,000 wafers a daya threshold for commercial usealthough customer systems may only deliver 800 wafers a day at first. ASML plans multiple upgrades of the optics and software that will enable its use at 7nm by focusing the EUV light to increasingly refined fractions of a die.


In 2015 and beyond, ASML foresees upgraded optics and software for EUV.

At the end of the day, an EUV system capable of production use at 7nm could cost $100 million to $120 million, twice the price of traditional immersion steppers. Van den Brink notes the designs are modular so that customers with earlier prototypes can upgrade them in stages.

More details on EUV progress

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