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TSMC guns for 7nm with EUV scanners

Posted: 09 Dec 2014 ?? ?Print Version ?Bookmark and Share

Keywords:7nm? EUV? 10nm? lithography?

TSMC's Liu and ASML's van Hout were attending TSMC's 14th annual Supply Chain Management forum on Dec. 4 to recognise the support and contributions of TSMC's suppliers.

"TSMC is committed to push Moore's Law as far as we can reach," Liu said in a speech at the Hsinchu, Taiwan gathering of the world's major chip-equipment makers. "We need to do early collaboration in equipment development to lower the cost of ownership for 10nm and beyond."

TSMC will not use EUV lithography for its first 10nm products, but the company is working with ASML to develop tools for the process technology, Liu said on Oct. 16.

"There is still some way to go to catch 10nm," Liu said at the time. "We're looking for an entry point after 10nm."

TSMC has announced that they will use the EUV scanners with the intent for early production, converting the initial two units to production standard, and adding two more units next year at the production standard, van Hout said. "Then, depending on the results, TSMC will progress to the next node, or extend the use from 10nm. That remains to be seen," van Hout said.

- Alan Patterson
??EE Times


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