Immersion light source improves on-wafer performance

Cymer LLC, an ASML company, has unveiled its argon fluoride (ArF) immersion light source built on the XLR platform. According to the manufacturer, the XLR 700ix offers improvements in bandwidth, wavelength and energy stability, allowing higher scanner throughput and process stability for advanced 14nm chip manufacturing and beyond.

The XLR 700ix affords chipmakers tighter bandwidth control (300+5fm) that essentially eliminates bandwidth as a source of process variation for on-wafer performance. Cymer's patented technology applies high-speed closed loop control on a pulse-by-pulse basis, resulting in extremely stable performance, stated Cymer.

The XLR 700ix introduces a reduction in helium consumption by 50 per cent, while providing stable performance across all conditions, even at high-duty cycles. Helium is mainly used in the line narrowing module (LNM) as a critical purge gas due to its unique thermal properties to ensure stable optical performance. Additionally, the XLR 700ix reduces power consumption by 15 per cent through the inclusion of the latest, field-proven master oscillator chamber design, enabling chipmakers to decrease operating costs.

The XLR 700ix also includes software updates that enhance light source predictability and availability, such as auto chamber conditioning and automated gas optimisation, delivering the highest system efficiency to meet demanding manufacturing schedules, added the company.

Cymer's XLR 700ix will begin shipping in 1Q15.