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2003-12-05 Nikon to introduce immersion scanner by 2006
Nikon Corp. said it will begin selling immersion lithography tools by 2006, joining the two other major lithography vendors, ASML and Canon.
2010-01-18 TSMC denies taking on Nikon scanner
Foundry giant Taiwan Semiconductor Manufacturing Co. Ltd denies buying a new 193nm immersion lithography scanner from Nikon Corp.for now.
2006-02-22 IBM claims 193nm litho record
At the SPIE Microlithography Conference, IBM said that it has created the world's smallest line patterns using 193nm optical lithography
2010-01-08 Buzz: TSMC buys Nikon 193nm litho scanner
In a surprise move, TSMC has procured a new 193nm immersion lithography scanner from rival Nikon Corp., according to sources.
2002-10-30 SMIC moves carefully towards 90nm development
Semiconductor Mfg Int. Corp. is gathering the tools it needs, including a 193nm scanner, to boost efficiency as it enters into 130nm manufacturing and prepares to begin basic development work for 90nm technology.
2010-02-15 Report: Samsung hogs ASML litho supply chain
Samsung is procuring a slew of 193nm scanners from ASML Holding NV, is hogging the supply chain for ASML systems
2006-07-13 Lithography vendors unveil next-gen scanners
Top lithography vendors are coming to market with next-generation immersion scanners for the 45nm node and beyond. Many will enter the arena at this week's Semicon West trade show.
2002-07-25 Industry said to face steep lithography challenges
Many in the semiconductor industry underestimate the technical and economic challenges posed by new forms of lithography, said Phil Ware, senior fellow at Canon Inc.
2011-10-13 Imec, ASML deal offers advanced litho tech
The five-year collaboration will allow ASML to install its 193nm immersion lithography tool at Imec, speeding up its work on EUV lithography
2007-02-27 IBM pushes for immersion at 22nm
IBM outlined last week its lithography roadmap, saying that it would extend 193nm immersion lithography down to the 22nm node for logic production
2010-03-09 ASML, Nikon battle over Intel litho biz
ASML Holding NV and Nikon Corp. are fighting over the 22nm lithography business at Intel Corp. But one analyst said both will share the 22nm business at Intel.
2010-03-01 Nikon updates litho roadmap
Nikon outlined its lithography roadmap and devised a new lens for its latest 193nm immersion scanner and revised its roadmap for extreme ultraviolet (EUV) lithography.
2006-08-01 Lithography efforts trailing 32nm target
The chip industry is enjoying a short reprieve as immersion lithography continues Moore's Law of scaling for the next few years. But for chips with a 32nm half-pitch, lithographers are counting on either extreme ultraviolet or immersion 193nm scanners enhanced with high-index fluids
2007-04-16 Litho woes weigh down semicon industry
The lithography world has suddenly turned upside-down as the industry gets socked by a double whammy: The window of opportunity is slowly closing on EUV lithography for IC production, but the most likely alternativea version of 193nm immersionis proving expensive
2004-09-16 Immersion effort looks to new crystals, liquids
Pushing 'wet' 193nm lithography to 45nm half-pitch takes more than water, experts say
2008-09-19 IBM pushes 'computational scaling' for 22nm
Amid probable delays with extreme ultraviolet (EUV) lithography, IBM Corp. plans to extend 193nm immersion and move towards what the company calls "computational scaling" technology for the 22nm node and perhaps beyond
2009-03-04 Deconstructing source-mask optimization tech
The SPIE Advanced Lithography conference witnessed a war of words among vendors developing source mask optimization tools in hopes of extending 193nm immersion lithography to the 22nm node
2009-09-23 Canon litho dreams hit price roadblock
The end could be near for Canon Inc.'s lithography efforts, as the company is reportedly mulling plans to cease future, high-end scanner development, according to sources
2004-04-23 VLSI papers weigh 65nm, new circuits
While technologists look to 65-nanometer nodes, circuit designers by and large are two generations back.
2010-06-25 Nikon stays optimistic amid losses
Nikon formulated a three-year medium term management plan that will run from fiscal 2011 to 2013. One of the goals is to bring the fab tool business back in the black.
2008-07-16 Litho options falling behind process needs
Who killed high-index lithography, and was politics the cause? These questions remain for chipmakers looking for a route to next-gen manufacturing in a shifting lithography landscape.
2009-06-25 Intel: Fab tool market savior?
Intel Corp. continues to fund technologies and procure fab-equipment, but behind the scenes, the company is investing in some companies and brokering deals for others, reportedly including ASM International NV and NuFlare Technology Inc., sources said.
2002-12-11 Infineon broadens tech strategy at China's SMIC
Infineon Technologies AG will swap its 0.145m DRAM trench technology with Semiconductor Mfg Int. Corp. in return for an exclusive agreement to make standard memory chips for Infineon.
2003-07-15 IBM study finds no ill effects on lithography
Researchers confirmed that early pattern imaging at IBM Corp.'s Almaden Research Center on wafers immersed in water has performed much better than expected.
2010-01-14 Exec lists roadblocks to fab tool recovery
At SEMI's Industry Strategy Symposium (ISS), Norm Armour, VP and general manager for Fab 2 at foundry upstart GlobalFoundries Inc. listed some challenges for tool vendors.
2009-11-02 Dongbu aims to be analog foundry powerhouse
South Korea foundry Dongbu HiTek Co. Ltd is looking for respect in the foundry business and aims at being the "TSMC" in analog and mixed-signal.
2004-10-29 Cypress SVTC sets up 200mm, 300mm lithography tool
Silicon Valley Technology Center (SVTC), a division of Cypress Semiconductor Corp., has installed a 200mm and 300mm wafer photolithography tool from ASML, and is now offering 65nm silicon processing capabilities to third-party companies.
2004-02-27 Applied makes 65nm X-architecture test chip
Applied Materials and Cadence Design Systems have made a 65nm test chip using diagonal as well as traditional right-angle Manhattan interconnects.
2007-10-26 Toshiba taps optical lithography in fabs
Despite the hype surrounding EUV, nanoimprint and other next-generation technologies, Toshiba is still using optical lithography in its current production fabs.
2008-07-02 Spansion all set for Numonyx challenge
Sizing up Numonyx as its new competitor, Spansion said it will keep a close eye on the company.
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