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2008-04-29 TSMC throws hat in 32nm high-k ring
TSMC has outlined details of its 32nm road map, giving an impression it may be playing catch-up with its foundry rivals, particularly in the emerging arena of high-k materials and metal gates
2008-06-12 TSMC targets to unify 32nm design flow
Facing the 32nm challenge, Taiwan Semiconductor Manufacturing Co. Ltd is putting the pedal to the metal with a new design-for-manufacturing scheme
2007-12-12 TSMC develops 32nm process sans high-k
TSMC said that it has developed a 32nm, low-power technology without having to resort to high-k gate dielectric and metal gates to achieve its performance characteristics
2008-06-17 Toppan boasts 'first' 32nm photomask
Toppan claimed that it is the first photomask maker to develop a 32nm manufacturing process, which enables to shorten photomask cycle time and help customers control mask costs by reducing the manufacturing process for critical layer masks
2008-10-31 SMIC gets export license for 32nm products
China foundry Semiconductor Manufacturing International Corp. (SMIC) will officially enter the 32nm technology era in January 2009
2008-10-07 SMIC braces for 32nm collaboration with IBM
Semiconductor Manufacturing International has presented its process road map, tipping its 45nm and 40nm technology for delivery in 2009.
2007-06-14 Renesas touts SOI SRAM tech for 32nm, beyond
Renesas has developed new technology to implement on-chip SOI SRAM in the 32nm node and finer processes.
2008-10-13 Panasonic, Renesas bring partnership to 32nm
Panasonic and Renesas are now collaborating on the development of elemental process technologies for SoCs of the next-generation 32nm node.
2006-07-14 Micron joins IMEC's 32nm research platform
IMEC announced that Micron Technology joined its (sub)-32nm CMOS research platform as core partner
2007-02-01 Logic chipmakers seek 32nm breakthroughs
Even as they put the finishing touches on their 45nm process technologies and tweak them for low power, leading-edge logic chipmakers are scrambling to find manufacturing breakthroughs for the 32nm node and beyond.
2006-08-01 Lithography efforts trailing 32nm target
The chip industry is enjoying a short reprieve as immersion lithography continues Moore's Law of scaling for the next few years. But for chips with a 32nm half-pitch, lithographers are counting on either extreme ultraviolet or immersion 193nm scanners enhanced with high-index fluids
2007-12-13 IMEC reports progress on high-k metal gates at 32nm
IMEC reported progress in improving the performance of planar CMOS using hafnium-based high-k dielectrics and tantalum-carbide metal gates targeting the 32nm CMOS node.
2006-01-13 IBM, Sony, Toshiba tip 32nm alliance
IBM, Sony and Toshiba disclosed that they have begun a new, five-year phase of their joint technology development alliance in ICs.
2008-09-15 IBM, NEC to develop 32nm IC processing
IBM and NEC have entered a multiyear joint development project where they will produce next-generation IC technology.
2008-04-16 IBM alliance makes progress in 32nm high-k metal gates
IBM and its partners in the race to develop and ship high-k dielectrics and metal gates for the 32nm node have officially revealed their process and are claiming they can now outperform the rest of the industry in performance and power consumption.
2006-10-03 IBM 'fab club' narrows options for 32nm
IBM's process-development partners did not disclose the exact details about its 32nm technology, but it did provide a glimpse of possible candidates for the "common platform" at that node.
2008-02-27 EU forms group to push for maskless litho at 32nm
The European Union has formed a program to push for the insertion of maskless lithography for IC manufacturing at the 32nm ''half-pitch'' node in 2009. The program is called Magicfor Maskless Lithography for IC manufacturing.
2007-05-25 Common Platform, partners extend chip pact to 32nm
Common Platform partners IBM, Chartered Semiconductor and Samsung Electronics, along with joint-development alliance partners Infineon and Freescale, announced plans to extend their chip development pact to the 32nm node.
2008-07-09 Buzz: Intel drops ASML, turns to Nikon for 32nm
In a major shift in strategy, Intel Corp. has selected Nikon Corp. over ASML Holding NV for the highly contested lithography order for the chip giant's 32nm node, according to sources.
2007-10-10 ARM bares initiative for physical IP at 32nm
ARM last week pulled back the curtain on its 32nm initiative for physical IP, at the same warning that the dreaded shift to 32nm will be an expensive and risky proposition
2007-12-19 Anxiety high as race begins for high-k 32nm
While foundries are just beginning to ramp their 45nm processes, vendors are already eyeing the next big challengethe race to develop and ship high-k dielectrics and metal gates for the 32nm node.
2007-09-06 AMD, Qimonda partner on 32nm CMOS simulation
AMD and Qimonda have launched a joint chip simulation project for 32nm CMOS and beyond
2010-09-22 Reality? project characterizes ARM926 for inherent variability at 32nm
An IMEC-led project, called “Reality?, has conducted a characterization of an ARM926 core for the statistical variability that is inherent at the 32nm manufacturing process node. The research project, set up in 2008, has cost about $5.8 million.
2011-11-08 Yield issues, defects mount in 28nm node
Are customers feeding overly optimistic targets for the 28nm process technology than the actual demand?
2008-06-05 TSMC stirs IC designs using 40nm node
Paving the way for next-generation chips, TSMC is set to roll out its latest design methodology for IC production at the 40nm node
2010-04-15 TSMC skips 22nm, leaps to 20nm half-node
Taiwan Semiconductor Manufacturing Co. Ltd announced plans to skip the 22nm "full node" after the 28nm node and move directly to the 20nm "half node
2009-09-07 TSMC rebounds with 28-/32nm roadmap
As it solidifies its process roadmap, foundry giant Taiwan Semiconductor Manufacturing Co. Ltd continues to see a surge in business.
2007-06-05 TSMC eyes 2009 for 32nm jump
TSMC is looking to unveil the 32nm process technology in two years' time, according to a DigiTimes report
2008-03-26 TMSC unveils 40nm 'half-node' step to 32nm
TSMC has unveiled an interim, 'half-node' step toward 32nm, which the foundry giant expects to ramp starting late next year.
2007-03-15 Photomask CD measurement system suits 45nm node
Vistec's new SEM-based CD measurement system is designed for the 45nm technology node photomask production and the 32nm process development.
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