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2016-03-09 Corial touts novel etching process for device deprocessing
In the failure analysis flow, the Corial 200I ICP system features etching processes targeted specifically at deprocessing of electronic devices down to 20nm.
2016-05-04 Software brings novel features to conventional dry etching
CORIAL said the COSMA Pulse can control and pulse simultaneously from each other all process parameters, including gas flow rate, working pressure, RF power, LF power, or virtual process parameters.
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