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2004-06-01	Samsung develops CVD wiring process for 70nm DRAM Samsung Electronics Co. Ltd has developed a chemical vapor deposition (CVD) method for depositing aluminum interconnect in DRAMs using a 70nm manufacturing process, the company said.
2010-09-08	New CVD reactor increases production, reduces power cost GT Solar bares SDR300 replacement boasting power savings and higher polysilicon production rate
2010-06-11	GT Solar bags $70M CVD equipment deal with Asia firm GT Solar has secured contracts with a total value of more than $70 million with a leading Asia polysilicon manufacturer for new chemical vapor deposition (CVD) equipment.
2010-08-25	Deposition tool roll out takes on HDP-CVD Applied announces a shallow trench isolation film deposition tool that is in step with the company's renewed emphasis on its chip-based fab tool business.
2013-08-14	CVD, Graphene Batteries ink joint IP dev't deal The agreement aims to further the development of NanotoMacro binderless lithium battery electrodes and related novel battery designs.
2012-10-03	CVD system to aid in solar cell optimisation, development The AltaCVD Solarlab tool reduces cycle times and materials consumption in fabricating advanced single-junction, tandem-junction and triple-junction PV cells.
2010-08-27	CVD system serves 20nm memory, logic chips The flowable chemical vapor deposition system from Applied Materials is capable of electrically isolating the densely-packed transistors in ICs 20nm-and-below with a high-quality dielectric film.
2006-10-06	CVD system enables low-temperature processing TEL has announced its latest 300mm metal CVD system that enables deposition of Ti and TiN films in low temperature process regimes.
2002-04-18	CVD process tames carbon nanotube growth A chemical-vapor deposition technique has been applied to carbon nanotubes to give them unusual electronic properties, according to researchers here at Rensselaer Polytechnic Institute.
2015-04-02	CVD graphene available on 100mm x 200mm substrates The high-quality polycrystalline graphene films promise to outperform what the competition can deliver in terms of low defect density and high mobility.
2002-06-21	CVD Equipment absorbs Conceptronic SMT business CVD Equipment Corp. has agreed to purchase substantially all assest of Conceptronic Inc.'s SMT business.
2010-09-07	ATMI, CVD, SiGen introduce a new class of components ATMI and Ovonyx make headway with germanium antimony telluride-based phase change memory devices using chemical vapor deposition processes while CVD Equipment Corp. and Graphene Laboratories Inc. have introduced a line of CVD graphene products. Not to be outdone, Silicon Genesis (SiGen) has started production of solar wafers using its new high volume manufacturing system, dubbed PolyMax.
2013-07-10	UNIST mass produces 3D mesoporous graphene A team from the Ulsan National Institute of Science and Technology developed a new method to massively synthesise enhanced, yet affordable, materials for supercapacitors.
2005-03-22	Trikon expands market focus amid Aviza merger Troubled Trikon Technologies Inc., which is in the process of being acquired, plans to expand its focus in the chip-equipment business.
2004-08-31	Spin-on, low-k dielectrics remain viable The ultimate ultra-low-k material that complies with the future microelectronics industry has not yet been found. The race between spin-on and CVD-deposited materials is still ongoing.
2002-05-07	Silicon substrates that bend and shape A Japanese team has found a way to bend and shape silicon substrates by growing a thin layer of diamond on top.
2016-05-09	Shadow mask eases graphene etching at room temp University of Illinois (Urbana-Champaign) researchers came up with a one-step process for quickly patterning and transferring graphene circuits to flexible substrates using a simple shadow mask.
2015-06-24	Scalable production of low-temperature 2D MoS2 films Researchers at the University of Southampton's Zepler Institute characterised large-area 2D films of molybdenum disulphide at room temperature using a process that is scalable to any size wafer.
2003-03-31	Samsung to deploy additional Mattson equipment in DRAM fab Samsung Electronics Co. Ltd has made follow-on orders to Mattson Technology Inc. for its RTP and CVD systems.
2002-05-22	Researchers seek 'green' chip-fabrication techniques A research team at the University of Arizona is working to develop environmentally friendly chip-fabrication chemistries that consume fewer resources and produce fewer hazardous byproducts than conventional techniques.
2013-05-15	Pad conditioner geared for wafer fabrication Morgan's Phoenix Edge pad conditioners claim to produce CMP pads with significantly smaller asperities and more consistent pad texture than those using traditional diamond crystals or grit.
2004-07-19	Novellus enhances chemical vapor deposition platform Novellus disclosed that it has made a significant enhancement to its chemical vapor deposition SPEED platform.
2005-06-22	Japanese researchers craft novel diamond semiconductor Researchers at Japan's National Institute of Advanced Industrial Science and Technology (AIST) have used a vapor deposition process to synthesize an n-type semiconducting 001 oriented diamond substrate.
2003-09-01	Identifying front-end challenges for 90nm design FEOL scaling is about density improvement while simultaneously improving transistor performance
2015-04-15	Graphene offers Moore's Law indefinite extension Apart from being dubbed as a wonder material for semiconductors and flaunting about 100 times the strength of steel by weight, graphene is considered ideal for nanoscale spintronic devices.
2002-01-07	Genus delivers 300mm ALD system to Japan Genus Inc. has shipped the industry's first 300mm atomic layer deposition (ALD) system to Japan's Asuka consortium.
2002-05-23	Endpoint detector lengthens chamber life The OPTI-Sense 4000 Endpoint Detector from IN USA Inc. uses non-dispersive (NDIR) infrared technology to automatically determine the endpoint of a the cleaning cycle of CVD chambers after wafer depositions.
2016-03-17	Edwards introduces green, cost-efficient vacuum pumps The iXM and IXL900R series are ideal for semiconductor etch and chemical vapour deposition (CVD) applications, and plasma vapour deposition (PVD) applications, respectively.
2015-07-30	Diamond substrate unleashes GaN potential Diamond substrates and heat spreaders enable GaN devices to operate near its peak power output without degradation in lifetime.
2008-06-11	Commentary: Applied's ASMI bid reads Intel Why did Applied Materials Inc. make an unsolicited bid to acquire a chunk of ASM International NV?