Global Sources
EE Times-Asia
Stay in touch with EE Times Asia
EE Times-Asia > Advanced Search > Collimated Plasma Lithography

Collimated Plasma Lithography Search results

total search4 articles
2003-03-26 JMAR, Collimated Plasma win sensor system contract
JMAR Technologies Inc. and Collimated Plasma Lithography systems have received a contract from FemtoTrace Inc. to design, develop and manufacture a line of advanced environmental sensors based on Reversal Electron Attachment Detection technology.
2003-02-10 JMAR streamlines lithography operations
JMAR Technologies Inc. will restructure and streamline its operations in order to improve profitability and better support the commercialization of its CPL semiconductor manufacturing systems and related technologies.
2002-08-13 JMAR contracts MIT for its lithography program
JMAR Technologies Inc. has initiated a contractual collaboration with MIT Prof. Henry I. Smith as part of its advanced semiconductor lithography program
2002-07-10 JMAR announces breakthrough in lithography technology
JMAR Technologies Inc. is using "Collimated Plasma Lithography" to more accurately describe its breakthrough technology for processing higher performance silicon and GaAs chips.
Bloggers Say

Bloggers Say

See what engineers like you are posting on our pages.

Back to Top