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2007-03-16 DFM demands holistic approach
The infrastructure required to make trade-offs among the different techniques and determine the optimal approach should be one where the actual software takes into account the implications of other DFM issues. The idea is to create a holistic approach to DFM for the design and analysis flow
2007-05-30 Routing suite receives 45nm design update
Gearing up to deal with 45nm IC physical design challenges such as interconnect resistance, Sierra Design Automation Inc. this week is announcing three significant enhancements to its Olympus-SoC placement and routing suite
2007-07-16 TSMC pulls curtains off 45nm design process
Taiwan Semiconductor Manufacturing Co. Ltd unveiled its latest and most ambitious design methodology for IC production at the challenging 45nm node
2006-10-31 Synopsys unveils DFM tools for 45nm, beyond
Synopsys has unveiled a new family of process-aware DFM products that analyze variability effects at the custom/analog design stage for 45nm and smaller designs.
2008-03-20 Synopsys IC Compiler qualifies for TSMC 45nm process
Synopsys has announced the qualification and immediate availability of its IC Compiler for designs targeting TSMC's 45nm process
2008-06-05 TSMC stirs IC designs using 40nm node
Paving the way for next-generation chips, TSMC is set to roll out its latest design methodology for IC production at the 40nm node
2007-02-01 Startup weaves new foundation for chip design
Fabbrix claims it can provide the regular circuit patterns or 'fabrics' needed by manufacturable designs at 65nm and belowwithout area, performance or power penalties
2006-01-02 Startup promises DFM-aware IC router
Startup Pyxis Technology Inc. has announced plans to field a design-for-manufacturability-aware IC router
2005-11-08 Panelists ponder challenges of 45nm
The move to the 45nm process node will be costly and challenging, but worth it for selected applications, according to panelists at the EDA Tech Forum here Thursday (Nov. 3
2007-06-13 Mentor acquires Sierra Design for $90M
Mentor Graphics has acquired Sierra Design Automation, a provider of high-performance place and route solutions, for $90 million
2007-06-01 IC designers favor less complex DFM
During the IEEE Electronic Design Process workshop, IC design experts point out that current approaches to design-for-manufacturing (DFM) may be yielding too little for the amount of effort and cost involved
2006-10-30 IBM, Chartered, Samsung opt for ARM's 45nm solution
IBM, Chartered Semiconductor Manufacturing and Samsung Electronics Co. Ltd have licensed ARM's proprietary products for 45nm low-power (LP) process technology
2007-07-12 Cadence, STARC team to address 65nm DFM issues
Cadence and STARC have partnered to deliver an advanced design flow to address 65nm DFM issues
2007-08-21 Cadence acquires DFM firm Clear Shape
Cadence Design has acquired Clear Shape Technologies, a design for manufacturing technology firm specializing in design-side solutions to minimize yield loss for advanced semiconductor ICs
2007-11-01 Addressing the issues of process node transition
To minimize some of the issues at 45nm designs, a heightened effort is required to develop tools and methodology to meet process power/performance and area entitlement from node to node
2009-03-24 Process variability gets a second chance
Mentor Graphics Corp. has a new message: process variability is not all bad. In fact, it could be considered a competitive advantage if properly dealt with, according to executives at the firm.
2007-01-04 EDA to remain strong in 2007
The EDA should have another good year in store, according to executives from large and small EDA companies.
2007-02-16 EDA growth to continue this year
The EDA industry grew faster than expected in 2006 and is up for another good year, thanks to a healthy IC industry, an insatiable CE market and a move to 65nm and 45nm technologies
2007-11-01 Dealing with IP at 65nm and below
The demand for connectivity intellectual property (IP) for high-speed serial buses is increasing. High-speed serial buses require high-performance analog/mixed-signal circuits that can be designed using standard deep sub-micron CMOS technologies
2007-07-17 Cadence acquires pattern-synthesis tech developer
Cadence Design Systems has acquired Invarium, a developer of advanced lithography-modeling and pattern-synthesis technology.
2008-05-01 Sign-off smartly with SSTA
At the 45nm process node, the SSTA approach to sign-off will allow designers to mitigate the effects of process variation, prevent silicon failures, and meet the demands of cutting-edge electronic design for the near future. It will usher in the much-anticipated "electrical DFM" that provides multi-objective placement, physical synthesis, and routing optimization while comprehending the full spectrum of physical and electrical implications of manufacturing
2007-06-14 Rivals play down threat of Mentor's Sierra acquisition
Mentor Graphics' rivalsSynopsys, Cadence and Magma Designregard Mentor's Sierra acquisition as a minimal threat, and their own positions in 65/45nm IC design as strong
2010-03-05 Six reasons why Samsung will succeed in foundry biz
Ana Hunter, VP of foundry services for Samsung Semiconductor Inc. provided six basic reasons why Samsung believes it will succeed in the foundry business
2008-11-17 Fab tech roll call: survival of the fittest
Manufacturers are rolling out 45nm ICs, with 32nm designs in the works; 22nm and even smaller devices are in R&D. But delivery of chips at 32nm and beyond won't be a cool breeze
2008-01-24 Japan's Starc uses Cadence's CPF tech in ref flow
Cadence Design Systems announced that Japan's Starc has released its next-generation ultralow-power Pride reference flow V1.5, incorporating the CPF-based Cadence Low-Power Solution.
2006-04-03 Easier OPC is tools' promise
Aprio Technologies and Brion Technologies recently launched optical proximity correction tools that promise greater accuracy and flexible user controllability.
2007-09-17 Asia's EDA moment is just around the corner
Mentor Graphics' Daniel Yang, managing director, Pacific Rim operations, discusses the Asian designer's future and how the region is shaping up to captivate the EDA industry.
2009-01-06 2009 IC fearless forecasts
2009 is just beginning to unfold in the electronics industry and there is already a looming uncertainty based on recent industry data.
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