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2006-05-01 Synopsys adding to its DFM lineup
Included in Synopsys' yearend agenda is the addition of a dual-domain simulation product and a next-generation yield analysis tool to its DFM product family.
2006-09-01 Restricted design rules challenge DFM
The recent Design Automation Conference made it clear that the EDA industry is counting on DFM for a much-needed boost. But the RDRs that are quietly emerging for 45nm and smaller geometries may reduce the need for some DFM tools and techniques, some observers say
2007-03-05 Integrated DFM solutions still lacking
According to a Charted Semi exec, EDA has done a great job of raising awareness of DFM issues, but integrated DFM solutions remain scarce
2007-06-18 Industry tackles approach to DFM, DFY issues
Experts from chip, EDA and foundry companies ask whether it's better to deal with DFM and DFY issues at tape-out or minister to the design starting at the register transfer level
2007-06-01 IC designers favor less complex DFM
During the IEEE Electronic Design Process workshop, IC design experts point out that current approaches to design-for-manufacturing (DFM) may be yielding too little for the amount of effort and cost involved
2005-06-20 Grace adopts Synopsys tool suite for chip production
Mainland China-based pure IC foundry Grace Semiconductor Mfg Corp. has adopted U.S.-based Synopsys Inc.' design for manufacturing (DFM) tool suite, particularly using the Proteus optical proximity correction (OPC) software and SiVL lithography verification tool to lower mask turnaround time and to enhance its ability to produce high-yielding chips.
2006-07-01 DFM tool targets parametric yield
Blaze DFM Inc. recently rolled out Blaze MO, said to be the first "electrical" DFM solution
2006-09-21 DFM tool implements yield improvement at design stage
Nannor said its upgraded Acuma tool reduces semiconductor design iterations and manufacturing costs by revealing yield-sensitive areas of the design and implementing yield improvement at the design stage
2006-01-12 DFM tool helps prevent mask failure at 65nm and below
SIGMA-C Software's microlithography simulation/image verification tool enables the transfer of electronic designs unto printed wafers to help prevent mask failure at 65nm and below
2003-05-09 Cadence buys mask prep company in DFM push
Cadence Design Systems Inc. is jumping firmly into the emerging design for manufacturing market following an announcement that it has acquired K2 Technologies Inc.
2006-11-16 Valor eases design with collaborative tool
vShare will provide a centralized, scalable platform with secure access to DFM-related design information, including design reviews, design changes and manufacturing sign-off
2005-05-11 TSMC expands DFM recommendations at 90nm
Taiwan Semiconductor Mfg Co. Ltd is expanding its design-for-manufacturing recommendations for engineers working with 90nm design rules, company managers told the TSMC 2005 Technology Symposium here last week.
2005-10-19 Tool suite 'lays foundation' for extending TCAD to DFM
Synopsys introduced early this week a new TCAD tool suite that integrates features of former TMA and ISE products as well as adding new capabilities that enable TCAD to be used in the manufacturing space
2006-12-13 Synthesis tool meets complex CMP design rules
The new synthesis tool from Blaze DFM Inc. inserts dummy fill patterns into a design layout and is said to optimally meet complex CMP design rules without requiring complicated scripts.
2006-10-31 Synopsys unveils DFM tools for 45nm, beyond
Synopsys has unveiled a new family of process-aware DFM products that analyze variability effects at the custom/analog design stage for 45nm and smaller designs
2004-05-14 Synopsys enhances SiVL verification tool
Synopsys has announced enhancements to its SiVL verification tool, a silicon-versus-layout tool
2004-09-01 Synopsys CEO calls for DFM cooperation
Synopsys CEO called on the design and fab communities to develop
2006-01-02 Startup promises DFM-aware IC router
Startup Pyxis Technology Inc. has announced plans to field a design-for-manufacturability-aware IC router.
2007-01-26 STARC to use Mentor's analyzer tool for DFM flow
Semiconductor Technology Academic Research Center will standardize on Mentor Graphics' Calibre YieldAnalyzer for critical area analysis in their DFM flow
2013-06-12 SilabTech uses Mentor Graphics' tool flow for 28nm PHY
SilabTech has achieved first silicon success for their latest 28nm high-speed, mixed-signal PHY IPs using Mentor Graphics' Pyxis, Eldo, and Calibre tools.
2003-10-09 Process tool promises yield optimization
PDF Solutions Inc. is expanding into EDA with a tool that claims to improve designs for optimum yield during the physical-synthesis stage
2003-12-01 Process tool promises yield optimization
PDF Solutions is expanding into EDA with a tool that claims to improve designs for optimum yield during the physical-synthesis step in the digital IC design process
2006-07-28 New Synopsys tool speeds production, time-to-market
Synopsis said PrimeYield predicts design-induced mechanisms that threaten manufacturing tolerances and provides automated correction guidance to upstream design implementation tools, resulting in accelerated time-to-production and time-to-market.
2004-11-19 Micron adopts Synopsys SiVL DFM for 90nm production
Micron Technology Inc. has chosen Synopsys Inc.'s SiVL silicon-versus-layout software to help implement its advanced DRAMs, flash memories, CMOS image sensors, and other semiconductor components.
2006-01-11 Mentor tool aims to manage process variability on yield
Mentor Graphics announced the availability of the Calibre OPCverify tool, which aims to address the challenge of managing the impact of "process variability" on yield
2004-09-23 Magma panelists explore whether DFM is the real deal
After much bravado, EDA vendors like Magma Design Automation and Mentor Graphics are starting to deliver viable design-for-manufacturability tools, or DFM-savvy tools
2005-06-29 Innovation, cooperation key to overcoming DFM issues, says Synopsys exec
Speaking to an audience of mostly photomask manufacturing executives at the Advanced Reticle Symposium Tuesday (June 28), Synopsys Inc.'s Michel Cote praised the way the EDA industry has responded to design-for-manufacturing (DFM) challenges with innovation and said continued industry cooperation is the key to overcoming them
2006-10-04 Industry players meet to discuss standard for Open DFM
Participants of the Open DFM Model Workshop last week explored issues ranging from DFM flows to encryption and identified possible next steps
2005-03-09 Indian EDA firm to launch software modules for DFM products
SoftJin said it would provide customized software development and building blocks to address the needs of suppliers in the DFM, DFY and programmable platforms products areas
2006-10-18 IC design tool touts process-aware DFM
Synopsys two "process-aware" tools that help custom- and analog-IC designers analyze the impact of transistor variability on circuit layouts.
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