- Article
(3) -
Forum
(0) -
Blog
(0)
total search3 articles
| 2006-11-01 | Tool reduces need for immersion at 45nm Invarium Inc. offers patterning-synthesis software promising, among other things, to limit the number of advanced layers that will require immersion at 45nm. This will allow customers to get more mileage out of existing lithography equipment. |
| 2006-09-20 | Tool limits need for immersion lithography at 45nm Invarium will roll out new patterning-synthesis software this week, promising, among other things, to limit the number of advanced layers that will require immersion at 45nm. |
| 2006-02-14 | New patterning synthesis solution for 65/45nm Invarium unveiled DimensionPPC, a unified, full-chip process and proximity compensation product for patterning IC layouts at 65nm and below. |
--- total search 3 articles, total 1 pages, The 1 Page ---
1Bloggers Say
See what engineers like you are posting on our pages.
All rights reserved.