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2002-03-19 TRW demonstrates advanced EUV light source
A TRW Inc. division said Thursday (March 14) that it and Sandia National Laboratories have conducted a lithography demonstration using a extreme ultraviolet light source
2011-04-28 Japanese light source providers part ways
Dissolving their partnership, Komatsu Ltd will acquire Ushio Inc.'s shares in Gigaphoton, thus making the light source venture its wholly owned subsidiary
2011-11-22 Issues of EUV lithography
Chip makers need EUV to be ready well in advance of when they plan to use it in volume manufacturing so they can establish chip design rules and tweak their manufacturing processes
2006-01-27 Intel invests in EUV source venture
Seeking to accelerate the development of extreme ultraviolet lithography, Intel Capital has invested in Germany's Xtreme Technologies.
2016-01-25 Improvement in light source could speed up EUV progress
Prototype systems in commercial fabs now use an 85W light source, soon to be upgraded to 125W, while ASML recently demoed an 185W capability and promises it will hit 250W before the end of the year
2011-03-04 EUV still hounded by power source issues
Leading chipmakers stress that EUV tools need 200W of power to process 100 to 150 wafers an hour. The currently used EUV tool from ASML is however running at just about 10W
2012-07-09 EUV light source emerges from nuclear fusion lab
Researchers from the University of Washington who have been able to produce a light source with enough power that it can be used to manufacture microchips have established a start up enterprise to bring the solution to market
2010-04-28 EUV light source achieves 104W output
Japan's Extreme Ultraviolet Lithography System Development Association (EUVA) claims to have achieved the highest output for EUV light source at 104W.
2002-04-18 CEO develops 1.5kW laser module for EUV lithography
Cutting Edge Optronics Inc. has demonstrated a 1.5kW laser module as a plasma source for extreme ultraviolet semiconductor lithography
2012-07-11 Zplasma in talks with ASML to develop EUV
EUV startup Zplasma has been in talks with several companies in hopes making a collaboration to develop a prototype source module
2008-02-06 Will EUV litho ever cross over from R&D to production
The procurement of an R&D EUV lithography tool from Nikon has reportedly been put off by Intel, raising more questions about the viability of EUV for mass chip production
2011-09-09 TSMC to start EUV lithography
In two weeks, TSMC will start using its first extreme ultraviolet machine.
2015-07-08 Trends, challenges for EUV lithography
Imec said cutting costs per transistor at the next-generation, the 10nm node, will be tricky, and even more challenging will be getting extreme ultraviolet lithography ready to enable a full 7nm node.
2014-09-17 Squeezing in Moore: Steppers for 10nm, EUV for 7nm
Considering the slow progress of EUV systems, manufacturers may have to make do with immersion steppers to fabricate 10nm chips, but once ready, EUV can be used for 7nm chip production
2015-03-25 Semicon manufacturing welcomes EUV lithography progress
The recent SPIE Advanced Lithography conference showcased a number of headway in extreme ultraviolet lithography that could possibly redefine how the process is being conducted.
2013-10-09 Researchers unravel new source of extreme UV light
Scientists blasted a 30?m droplet of tin with a high-powered laser 6,000 times a second and found that 30 per cent of the EUV emission came from behind the part of the droplet that was struck by the laser
2003-09-04 Japan plays catch-up on EUV lithography
A consortium of nine Japanese companies working on extreme-ultraviolet lithography says it is making steady progress toward a spring 2006 target for fielding an alpha tool that would provide 10W of EUV output power
2009-06-16 Intel, TSMC to tap ASML's EUV litho tool
Hynix Semiconductor, IMEC, Intel, Samsung, Toshiba and possibly Taiwan Semiconductor Manufaturing Co. are the initial customers for ASML Holding NV's "pre-production" extreme ultraviolet (EUV) lithography tool
2014-07-21 Intel, Berkeley Lab develop super-resist for EUV
The innovative super-resist addresses the demands of advanced nodes of 10nm and below using extreme-ultra-violet light, which needs both sensitivity and mechanical stability
2004-08-05 Intel unveils EUV micro-exposure tool
Intel Corp. has installed an extreme ultraviolet (EUV) micro-exposure tool (MET) from Exitech Ltd at its development fab in Sta. Clara, California
2014-08-05 Industry analyst sceptical on IBM EUV results
IBM announced this week that the ASML NXE3300B scanner installed at its facility in Albany, N.Y., produced 637 wafers in 24 hours at a steady rate of 34 wafers/hour with a light source delivering 44W
2014-08-01 IBM unveils remarkable progress in EUV lithography
According to the company, the NXE3300B scanner produced 637 wafers in 24 hours at a steady rate of 34 wafers/hour with a light source delivering 44W
2007-11-06 Firms collaborate on EUV source development
Japan's Ushio has announced that it is partnering with Koninklijke Philips Electronics NV and Jenoptik Laser Optik Systeme GmbH to co-develop EUV light sources for lithography
2015-08-28 EUV reaches angstrom resolution
The angstrom-level resolution of a new type of microscope uses femtosecond pulses of extreme ultraviolet light (EUV), the same wavelength light to be used for sub-10nm semiconductor lithography
2011-03-03 EUV late for 10nm party, says Intel
Although it is late for the 10nm design rule definition stage at Intel,
2012-10-09 Commercialisation of 14nm chips moved back due to EUV delays
In order to lay down patterns on next-gen chips that target sizes as small as 14nm, EUV systems need light sources that are nearly 20 times more powerful than the ones that are currently available
2012-10-19 ASML pumps up EUV initiative with Cymer purchase
ASML is looking to enhance is extreme ultraviolet lithography system by buying longtime supplier Cymer.
2009-10-12 ASML details EUV lithograpohy roadmap
ASML showed a rough road map for extreme ultraviolet (EUV) lithography systems that could be ready for commercial use in late 2012
2009-06-08 ASML details EUV litho production plan
ASML Holding NV has tipped the roadmap for the introduction of its first extreme ultraviolet (EUV) lithography machines at the IMEC Technology Forum
2003-01-08 Researchers improve tabletop EUV laser system
Researchers at the University of Colorado have boosted the output power and reduced the beam wavelength of their tabletop extreme ultraviolet laser system built with off-the-shelf components without altering its $5,000 cost.
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