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2012-07-11 Zplasma in talks with ASML to develop EUV
EUV startup Zplasma has been in talks with several companies in hopes making a collaboration to develop a prototype source module
2008-02-06 Will EUV litho ever cross over from R&D to production
The procurement of an R&D EUV lithography tool from Nikon has reportedly been put off by Intel, raising more questions about the viability of EUV for mass chip production.
2010-06-14 Will EUV litho be ready for 22nm
EUV is creeping closer to the technical specifications that would allow high volume manufacturing but it now looks unlikely to arrive in time to take much part in the 22nm node
2010-07-20 Uncertainty marks future of advanced lithography
Industry players present in Semicon West's session on advanced lithography sparked arguments on what the future holds as complexities and costs increase
2012-11-01 TSMC: Quad patterning likely alternative to EUV for 10nm
TSMC's chief technologist stated that quad patterning may be needed for 10nm process technology if extreme ultraviolet lithography is not available by 2015
2009-06-15 TSMC weighs in on e-beam, EUV litho
Foundry giant Taiwan Semiconductor Manufacturing Co. Ltd is still backing two horses in the race to the next lithography extreme ultraviolet lithography (EUVL) and clustered electron-beam
2011-09-09 TSMC to start EUV lithography
In two weeks, TSMC will start using its first extreme ultraviolet machine.
2014-12-09 TSMC guns for 7nm with EUV scanners
ASML said on November 24 that TSMC has ordered two NXE:3350B EUV systems for delivery in 2015 with the intention to use the systems in production
2015-12-17 TSMC begins work at 5nm, plans for EUV remain unclear
The foundry's initial development work at 5nm may be yet another indication that extreme ultraviolet lithography has been set back as an eventual replacement for immersion lithography
2015-07-08 Trends, challenges for EUV lithography
Imec said cutting costs per transistor at the next-generation, the 10nm node, will be tricky, and even more challenging will be getting extreme ultraviolet lithography ready to enable a full 7nm node
2009-11-19 Toshiba touts EUV photoresist for 20nm process
Toshiba Corp. has developed a photoresist suitable for use with EUV lithography and proved its viability in the first 20nm generation process technology.
2007-10-08 Toshiba mulls over 450mm fab, EUV litho
Aiming to maintain its edge in the IC market, Japan's Toshiba Corp. is exploring several new chip-production technologies, including 450-mm fabs and EUV lithography.
2011-01-20 Toppan-IBM photomask agreement to cover 193nm immersion lithography
Toppan Printing Co. Ltd and IBM have agreed to extend their joint photomask process development efforts involving the 14nm technology node for logic devices. The companies will now collaborate on ArF immersion lithography for the 14nm node
2014-09-17 Squeezing in Moore: Steppers for 10nm, EUV for 7nm
Considering the slow progress of EUV systems, manufacturers may have to make do with immersion steppers to fabricate 10nm chips, but once ready, EUV can be used for 7nm chip production
2015-03-25 Semicon manufacturing welcomes EUV lithography progress
The recent SPIE Advanced Lithography conference showcased a number of headway in extreme ultraviolet lithography that could possibly redefine how the process is being conducted
2010-06-08 Sematech, AZ work on EUV resist issues
AZ Electronic Materials has joined Sematech's Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.
2009-03-03 Sematech, Asahi Glass to improve EUV mask blank yield
Sematech and Asahi Glass Co. (AGC) have entered into a joint development partnership to accelerate mask blank commercialization.
2004-07-09 Sematech to open R&D center for immersion lithography
International Sematech on Tuesday (July 6, 2004) announced the formation of an R&D center to develop and push immersion lithography into the marketplace
2008-08-14 Sematech reports progress on EUV litho for 22nm
Sematech has disclosed a way of using extreme ultraviolet (EUV) lithography to define silicon devices with a half-pitch resolution as small as 22nm.
2013-04-09 SanDisk will only switch to EUV for ReRAM
The storage memory supplier does not expect to use extreme ultraviolet lithography for its current NAND process
2010-02-23 Samsung to push EUV litho by 2012
Samsung Electronics Co. Ltd announced its plans to push wants extreme ultraviolet (EUV) lithography by 2012 despite signs that the technology will not be ready by that time at the LithoVision 2010.
2012-08-29 Samsung to invest $345.5 million in Lithography dev't
Samsung joins Intel Corp. and Taiwan Semiconductor Manufacturing Co. Ltd. in investing in ASML to support the development of next generation EUV and 450-mm lithography tools.
2003-01-08 Researchers improve tabletop EUV laser system
Researchers at the University of Colorado have boosted the output power and reduced the beam wavelength of their tabletop extreme ultraviolet laser system built with off-the-shelf components without altering its $5,000 cost.
2002-05-29 R&D association targets EUV lithography laser
Ten Japanese companies have formed an R&D association to develop a high-power laser technology by 2005 for use in extreme ultraviolet (EUV) lithography systems.
2007-02-28 Nikon to ship EUV tools to Intel, Selete
Nikon outlined its roadmap in the EUV lithography arena and disclosed plans to ship two prototype tools by year's end to Intel Corp. and Selete.
2009-05-21 Nikon denies EUV litho program delay
Responding to an analyst, Nikon Corp. stated that its extreme ultraviolet (EUV) lithography program is still alive and well.
2012-12-19 Lithography expert still not sold on EUV
It was the end of the semiconductor roadmap for 193nm lithographythe next generation would have to go to 157nm light
2002-08-13 JMAR contracts MIT for its lithography program
JMAR Technologies Inc. has initiated a contractual collaboration with MIT Prof. Henry I. Smith as part of its advanced semiconductor lithography program
2011-09-16 Japan's EUV litho JV welcomes foreign chip firms
To hasten the adoption of EUV lithography worldwide, EIDEC has begun collaborating with foreign chip companies.
2003-09-04 Japan plays catch-up on EUV lithography
A consortium of nine Japanese companies working on extreme-ultraviolet lithography says it is making steady progress toward a spring 2006 target for fielding an alpha tool that would provide 10W of EUV output power.
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