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2011-11-22 Issues of EUV lithography
Chip makers need EUV to be ready well in advance of when they plan to use it in volume manufacturing so they can establish chip design rules and tweak their manufacturing processes
2009-02-25 Intel: EUV litho roadblocks ahead
A top technologist at Intel Corp. warned that a lack of mask inspection gear for extreme ultraviolet (EUV) lithography is threatening the process' future viability in the market.
2009-06-16 Intel, TSMC to tap ASML's EUV litho tool
Hynix Semiconductor, IMEC, Intel, Samsung, Toshiba and possibly Taiwan Semiconductor Manufaturing Co. are the initial customers for ASML Holding NV's "pre-production" extreme ultraviolet (EUV) lithography tool.
2004-08-05 Intel unveils EUV micro-exposure tool
Intel Corp. has installed an extreme ultraviolet (EUV) micro-exposure tool (MET) from Exitech Ltd at its development fab in Sta. Clara, California
2002-04-24 Intel orders scanner to develop commercial EUV lithography
Intel Corp. has ordered a beta-stage extreme ultraviolet lithography scanner from ASM Lithography to help it prepare for production of 45nm linewidth ICs using commercial EUV tools later this decade.
2006-01-27 Intel invests in EUV source venture
Seeking to accelerate the development of extreme ultraviolet lithography, Intel Capital has invested in Germany's Xtreme Technologies
2004-01-28 Intel grants Cymer $20M funding for EUV litho development
Intel Corp. has agreed to provide Cymer Inc. funding of $20 million over the next three years to accelerate development of production-worthy EUV lithography light sources.
2010-02-24 Intel extends immersion litho to 11nm, delays EUV
Intel Corp.'s lithography roadmap plans to extend its 193nm immersion to the 11nm logic node and delay extreme ultraviolet (EUV)again.
2007-06-25 Intel drafts inverse litho to cover EUV delay
With the possible delay of its EUV lithography, Intel disclosed it is developing a DFM technology that could extend optical scanners to the 22nm node.
2002-07-25 Industry said to face steep lithography challenges
Many in the semiconductor industry underestimate the technical and economic challenges posed by new forms of lithography, said Phil Ware, senior fellow at Canon Inc
2008-01-23 IMEC, U.S. university partner on EUV litho research
EUV litho experiments will be carried out in collaboration by IMEC and the College of Nanoscale Science and Engineering of the University at Albany as a means to accelerate the introduction of the process in manufacturing
2011-07-14 Imec, SUSS MicroTec to develop EUV mask tech
Imec and SUSS MicroTec are expanding their research partnership to develop an in-fab approach to EUV lithography focusing on mask integrity.
2007-10-19 IMEC, ASML expand EUV litho ties
IMEC and ASML Holding NV have has expanded their partnership on the EUV lithography front.
2013-10-09 IMEC, ASML collaborate to optimise lithography systems
The joint effort between IMEC and ASML will research ways immersion and EUV lithography systems can automatically adjust parameters to maintain an optimal process window.
2008-10-23 IMEC favors EUV litho for 22nm node
Kurt Ronse, director of the advanced lithography program, IMEC, has favored extreme UV lithography as most likely how the semiconductor industry will make ICs with minimum geometries of 22nm and finer
2013-02-08 IBM: EUV lithography not ready until 7nm node
IBM warns that EUV lithography will not be ready until the 7nm node but Globalfoundries and Samsung say they are on track to offer 14nm FinFET manufacturing by 2014.
2014-08-01 IBM unveils remarkable progress in EUV lithography
According to the company, the NXE3300B scanner produced 637 wafers in 24 hours at a steady rate of 34 wafers/hour with a light source delivering 44W.
2011-02-07 First EUV tool ships amid power, tech concerns
ASML may have shipped the world's first EUV lithography tool, but experts insist EUV is not yet ready.
2009-02-26 Firms gear for EUV litho despite tool delay
ASML Holding NV has slightly delayed the delivery schedule for its "pre-production" extreme ultraviolet (EUV) lithography tool by a quarter or so.
2007-11-06 Firms collaborate on EUV source development
Japan's Ushio has announced that it is partnering with Koninklijke Philips Electronics NV and Jenoptik Laser Optik Systeme GmbH to co-develop EUV light sources for lithography.
2011-03-04 EUV still hounded by power source issues
Leading chipmakers stress that EUV tools need 200W of power to process 100 to 150 wafers an hour. The currently used EUV tool from ASML is however running at just about 10W
2006-11-20 EUV making slow progress, reports Intel
An Intel Corp. technologist disclosed that extreme ultraviolet (EUV) lithography is making little progress, prompting the firm to look at the deployment of immersion technology at its 32nm node.
2012-07-09 EUV light source emerges from nuclear fusion lab
Researchers from the University of Washington who have been able to produce a light source with enough power that it can be used to manufacture microchips have established a start up enterprise to bring the solution to market.
2010-04-28 EUV light source achieves 104W output
Japan's Extreme Ultraviolet Lithography System Development Association (EUVA) claims to have achieved the highest output for EUV light source at 104W.
2011-03-03 EUV late for 10nm party, says Intel
Although it is late for the 10nm design rule definition stage at Intel,
2008-07-22 EUV delays drive shift to double-patterning
With the probable delays for EUV lithography, ASML, Canon and Nikon are racing each other to capitalize on the shift towards double-patterning technology at the 32nm node and beyond.
2010-02-26 EUV delay forces tool makers to check other options
EUV lithography is delayed again and is now targeted for chip production at the 16nm half-pitch node, leaving the industry to face the dreaded double-patterning or some variation of the technology.
2003-02-19 EUV activity shifts to Sematech North
Developers of EUV lithography are looking north, specifically to the University at Albany, State University of New York, for their future.
2002-04-18 CEO develops 1.5kW laser module for EUV lithography
Cutting Edge Optronics Inc. has demonstrated a 1.5kW laser module as a plasma source for extreme ultraviolet semiconductor lithography
2009-05-19 ASML to benefit from Nikon EUV litho delay
Nikon is said to have put on hold development of some of its extreme ultraviolet (EUV) tools, which could give ASML a huge early advantage in commercial deployments of the emerging chip making technology
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