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euvl What is Extreme Ultra-Violet radiation (EUV)? Search results

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What is Extreme Ultra-Violet radiation (EUV)?
Extreme Ultra-Violet (EUV) radiation is generally considered to be the part of the electromagnetic spectrum spanning from 120nm down to 10nm. Its main uses are photoelectron spectroscopy, solar imaging and lithography.
Extreme ultraviolet lithography (EUVL) is a next-generation lithography technology using the 13.5nm EUV wavelength.
total search16 articles
2006-02-20 EUVL achieves 'cleaning milestone'
Sematech North researchers working on extreme ultraviolet lithography (EUVL) claims to have achieved an important breakthrough in the complex process of cleaning mask blanks.
2005-10-18 ASML's EUVL alpha tool shipments slip to Q2
European lithography equipment vendor ASML Holdings NV now expects to ship its two alpha extreme ultraviolet lithography (EUVL) tools in the second quarter of 2006, the company said. This is a change from previous expectations that the tools would ship in the first quarter.
2009-06-15 TSMC weighs in on e-beam, EUV litho
Foundry giant Taiwan Semiconductor Manufacturing Co. Ltd is still backing two horses in the race to the next lithography extreme ultraviolet lithography (EUVL) and clustered electron-beam.
2006-08-01 Lithography efforts trailing 32nm target
The chip industry is enjoying a short reprieve as immersion lithography continues Moore's Law of scaling for the next few years. But for chips with a 32nm half-pitch, lithographers are counting on either extreme ultraviolet or immersion 193nm scanners enhanced with high-index fluids.
2008-01-23 IMEC, U.S. university partner on EUV litho research
EUV litho experiments will be carried out in collaboration by IMEC and the College of Nanoscale Science and Engineering of the University at Albany as a means to accelerate the introduction of the process in manufacturing.
2012-09-21 EMI partnership adds SK Hynix in metrology research
The EUVL Mask Infrastructure (EMI) partnership was launched by Sematech adds SK Hynix to to bolster its attempts in tackling infrastructure gaps for EUV lithography in mask metrology.
2008-02-06 Will EUV litho ever cross over from R&D to production?
The procurement of an R&D EUV lithography tool from Nikon has reportedly been put off by Intel, raising more questions about the viability of EUV for mass chip production.
2010-06-08 Sematech, AZ work on EUV resist issues
AZ Electronic Materials has joined Sematech's Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.
2008-03-31 Sematech forum to tackle transition to 22nm
The Sematech consortium is planning to host a three-day lithography forum May 12-14 because it is concerned about the growing uncertainty on the approach manufacturers and suppliers should take to transition from the 32nm to the 22nm half-pitch technology node.
2005-10-04 Litho magnification ratio unlikely to change at 32 nm
Lithography photomasks are likely to continue to rely on the current standard 4X magnification and 26mm field size through the 32nm node, according to a consensus of semiconductor equipment suppliers and manufactures at a recent Sematech-sponsored workshop.
2011-06-27 KLA joins Sematech's litho defect reduction program
Upon joining the Sematech program, KLA will collaborate with the consortium's engineers on such areas as defect source identification and elimination, and EUV manufacturability and extendibility.
2011-09-16 Japan's EUV litho JV welcomes foreign chip firms
To hasten the adoption of EUV lithography worldwide, EIDEC has begun collaborating with foreign chip companies.
2008-10-23 IMEC favors EUV litho for 22nm node
Kurt Ronse, director of the advanced lithography program, IMEC, has favored extreme UV lithography as most likely how the semiconductor industry will make ICs with minimum geometries of 22nm and finer.
2011-05-24 FUJIFILM joins SEMATECH's resist center
FUJIFILM has joined SEMATECH's Resist Materials and Development Center to further enhance the technology on image development and testing imaging materials for EUV sensitivity.
2012-04-03 ASML dominates litho market
ASML was responsible for 57 percent of the lithography tools shipped last year, with Nikon accounting for 28 percent and Canon 15 percent.
2010-09-29 Are Japan litho companies on the way out?
Japanese lithography equipment makers look set to fall further behind market leader ASML Holding NV, according to analysts with investment broker Nomura.
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